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Hitachi High-Technologies in Canada

FB2200 Focused Ion Beam System

The dedicated single column FIB system incorporates a gallium sourced high accelerating voltage of 40kV allowing a high current density ion beam to realize rapid and precise specimen preparation for both transmission and scanning electron microscopy. The system also runs at very low accelerating voltage for minimizing Ga ion implantation and the removal of amorphous material. Both SEM and TEM stages are available, and a variety of holders including air protection, cryo cooling, 3D analysis holders are available. Holder compatibility with Hitachi SEMs and TEMs realizes QTAT and ease of use.


High precision and high milling rates

  • The use of a new low aberration ion optical system allows a maximum beam current of 60nA at an accelerating voltage of 40 kV.

A microsampling TEM/STEM in-situ lift out system available optionally

Hitachi FB2200 FIB Microsampling

  • Site specific micro-sampling preparation from bulk samples is achieved in a completely dry vacuum environment allowing preparation of samples free from foreign particles, oxidation, charging and other problems
  • A newly developed isolation sample holder allows the encapsulation of a milled specimen into a protective atmosphere for contamination free transfer into an external analysis SEM/TEM.

Minimizing specimen damage

Hitachi FB2200 FIB Micropillar

  • Compatible specimen holders for FB2200 and Hitachi TEMs/SEMs are provided for specimen preparation with high precision and reliability. This arrangement allows milling and microscopy without speciment repositioning when transferring the sample between your Hitachi TEM or SEM minimizing specimen damage during repeated preparation and microscopy.

A wide range of beam energies

  • Operators can choose the optimum operating voltage (or beam energy) for milling and microscopy to best suit the specimen. Low beam energies of 2kV and 5kV for specimen fine polishing are available as option.

Sample Holder Compatibility to Hitachi (S)TEM, SEM

Nothing is worse than loosing a nicely prepared TEM sample by some accident during a manual transfered from the FIB sample holder to another one fitting into the target SEM or (S)TEM.

With the FB2200, this problem does not exist.

Hitachi offers compatible sample holders which can be inserted in both, the FIB and the SEM/(S)TEM unit. Once the specimen has been mounted on the compatible holder by Hitachi's patented in-situ microsampling system, besides a safe, quick transfer from the FIB to the analysis tool, this concept also allows an easy re-work of pre-prepared specimen if this should be required.

Holder compatibility exists between FB-2200 and the following models:

  • S-4700, S-4800I
  • S-4800II, SU6600, SU-70, SU8000
  • S-5200 / S-5500
  • HD-2300A, HD-2700
  • HF-3300

Hitachi FB2200 FIB and SEM compatibility


Accelerating Voltage 10 - 40 kV
2 and 5 kV optionally available
Maximum beam current
(high beam current optional)
60nA at 40 kV
Maximum beam current density 50A/cm2 at 40 kV
SIM image resolution 6 nm or better at 40 kV
Micro Sampling System for in-situ
TEM lamella extraction
Deposition systems W, C dual system
Auto-fabrication software incl. milling position correction
Eucentric Auto-Stage (2 types) for larger specimen Allows sample holder compatibility to SEM
Side Entry Stage (3 types) Allows sample holder compatibility to TEM, HD, S-5500



The FB-2200 allows for rapid and precise specimen preparation for both transmission and scanning electron microscopy of semiconductors and other advanced materials.