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Hitachi

Hitachi High-Technologies in Canada

Analytical UHR Schottky Emission Scanning Electron Microscope SU-70

Analytical FE-SEM combines the field-proven stability, high current, and brightness with ultra-high resolution required for a multitude of analytical applications. The Duo-objective Lens designed with a semi-in-lens optics provides capabilities for a wide range of applications that require high-resolution image observation and analysis. The SU-70 offers a industry-leading technology, quality, and reliability.

Overview

The Hitachi SU-70 Analytical Field Emission SEM combines the field proven stability, high current and brightness of the Schottky electron source with the ultra-high resolution required in a multitude of analytical applications. Designed with a semi-in-lens optical configuration, Hitachi's patented ExB technology provides a unique electron signal filtering and mixing system suited for today's demanding applications for research and development and multidiscipline studies.

The large specimen stage and analytical chamber accommodate a wide variety of analytical instrumentation such as EDS*, WDS*, EBSP*, CL*, STEM*, and e-Beam Lithography* techniques optimized for simultaneous analysis.

The SU-70 Analytical FESEM continues the tradition of providing industry leading technology coupled with the quality and reliability recognized throughout the industry in Hitachi products and services.

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Option

Features

Ultra High Resolution Imaging; 1 nm/15 kV, 1.6 nm/1 kV (with Beam Deceleration Moda)*

Ultra high resolution performance made possible with Hitachi's patented semi-in-lens optical design and electron gun technology.

In-lens SE and BSE Signal Filtering and Mixing Mode

Enables SE and BSE signal collection and control to eliminate or reduce specimen charging and enhance compositional contrast information.

Sub Nanometer Level Surface Observation at Ultra Low Accelerating Voltages

Provides high resolution, sub nanometer level surface observation at ultra-low accelerating voltages down to 100 V by utilizing the electron beam deceleration function.

Maximum Probe Current of 100 nA or Greater Available with the Field Proven Schottky Electron Source

High current and high resolution conditions are optimized for analytical techniques such as EDS*, WDS*, EBSP*, CL*, and e-Beam lithography* for increased productivity and throughput.

EBSP Analysis In Field Free (FF) Mode

Hitachi's unique FF mode eliminates the projected magnetic field of the objective lens associated with semi-in-lens technology, and thereby eliminates artifacts during analysis of magnetic samples and with EBSP* applications.

Large Analytical Specimen Chamber

Designed to optimize the simultaneous analysis of a wide variety of analytical techniques such as EDS*, WDS*, EBSP*, CL* and e-Beam Lithography* by optimizing the analytical detector solid angle and maintaining high resolution.

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Option

Application Data

Life Sciences

Protein on Metal Substrate

Specimen Courtesy of OLYMPUS Corporation.
Specimen Courtesy of OLYMPUS Corporation.

Dark contrast shows protein distribution on substrate.
BSE and SE signal mixed image acquired at 1 kV.

Materials Science

Ni alloy (Inconel)

Elemental analysis of precipitate.
High probe current application -WDS analysis-

SE image
SE image

HV=10 kV

WDS map shows Molybdenum distribution in precipitates.
High probe current of SU-70’s electron optics supports WDS analysis.

DP steel phase analysis, EBSD+EDS simultaneous acquisition

bcc+fcc IPF (Z) map

Ni Kα

phase map

 

Semiconductors

-wide gap semiconductor - crystal defect examination by using cathode luminescence

SE imageSE image
Specimen : AlGaN
HV : 2 kV

Pan-chromatic CL imagePan-chromatic CL image

Mono-CL images

Mono-CL images

STEM images of SRAM cross section

Specimen : AlGaN / GaN
HV : 2 kV

RGB overlaid image
R : 345 nm
G : 328 nm
B : 310 nm

STEM images of SRAM cross section