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Field Emission Scanning Electron Microscopes have grown to be an indispensable tool to observe nano-scale structures from a wide range of materials, especially of the nanotechnology field. The SU8010 has excellent imaging performance throughout the entire energy range for the most demanding application. The FE-SEM supports numerous workhorse environments such as material research & development and industrial quality control.
The SU8010 FE-SEM is among an extended lineup of Hitachi's range of ultra-high performance, semi-in-lens SEM with cold-field-emission source technology. It comes in response to a growing market demand for flexible solutions to application and budget needs.
Founded on an improved common electron optics platform that can achieve an ultra-low voltage imaging resolution of just 1.3 nm at 1.0 kV, Hitachi High-Technologies utilizes innovative detectors to optimize imaging performance, including the latest generation of Hitachi's patented super ExB in-lens detection for energy filtering, charge suppression, and contrast control. The user-friendly GUI with a 24.1-inch wide viewing monitor contributes to a comfortable operation.
Hitachi's cold-field-emission technology with double condenser optics ensures that superb resolution and full control of probe current from 1 pA to more than 5 nA are achieved, which is ideal for observation of sensitive specimens as well as for elemental analysis (EDX) suited for today's SDD detectors that achieve on the order of 10,000 to 100,000 counts per second.
The SU8010 FE-SEM is equipped with Lower in-chamber/Upper in-lens (Dual) electron detectors and offers multiple system configurations to meet the wide range of customer-specific needs for indispensable ultra-high-resolution microscopy in the nanotechnology fields, such as semiconductors, electronics, catalysis and other functional materials, biotechnology, pharmaceuticals, and more.