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Ultra-High-Resolution FE-SEM has grown to be an indispensable tool to observe the fine surface structure of materials in a wide range of the nanotechnology field. The SU8010 has excellent imaging performance throughout the range for the wide variety of demanding high-resolution application. The robust FE-SEM supports material research, development, and industrial quality control enviroments as workhorse.
The SU8000 family is a newly extended lineup of Hitachi's range of ultra-high performance, semi-inlens SEM with cold field emission source. It comes in response to a growing market demand for flexible solutions to application and budget needs.
Founded on an improved common electron optics platform across the SU8000 family that can achieve a stunning ultra low voltage imaging resolution of just 1.3nm at 1.0kV, Hitachi High-Technologies utilizes innovative detectors to optimize imaging performance, including the latest generation of Hitachi's patented super ExB in-lens detection for energy filtering, charge suppression, and contrast control. The user-friendly GUI with 24.1-inch wide viewing monitor contributes to comfortable operation.
Hitachi's cold field emission technology with double condenser optics ensure the superb resolution and full control of probe current from 1pA to more than 5nA; ideal for observation of sensitive specimens and for elemental analysis (EDX)—where today's SDD detectors achieve on the order of 10000 to 100000 counts per second.
The members of the SU8000 family offer a variety of stage, specimen chamber and signal detection system configurations to meet the wide range of customer-specific needs for indispensable ultra-high-resolution microscopy in the nanotechnology fields, such as semiconductors, electronics, catalysis and other functional materials, biotechnology, pharmaceuticals, and more.