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The Cold Field Emission source is ideal for high-resolution imaging with a small source size and energy spread. Innovative CFE Gun technology contributes the ultimate FE-SEM with superior beam brightness and stability affording high-resolution imaging and high-quality elemental analysis at low acceleration voltage.
Hitachi's next generation Cold Field Emission SEM offers unmatched low‑voltage imaging and comprehensive analytical microanalysis with the uncompromised performance of CFE.
The 8200 Series FE-SEM employs a novel cold field emission (CFE) gun for improved imaging and analytical performance. The newly designed Hitachi CFE gun complements the inherent high resolution and brightness of conventional CFE with increased probe current and beam stability.
The members of the SU8200 family offer a variety of stage, specimen chamber and signal detection system configurations to meet the wide range of customer-specific needs for indispensable ultra-high-resolution microscopy in the nanotechnology fields, such as semiconductors, electronics, catalysis and other functional materials, biotechnology, pharmaceuticals, and more.
SU8220: Standard stage model
SU8230: Large chamber/large stage model
SU8240: Regulus® stage, high precision stage model
Sample: mesoporous silica nanospheres; Landing voltage: 500 V
Sample courtesy of Tokyo Institute of Technology, Dr. Toshiyuki Yokoi
Sample: Au/Cu2O core-shell nanocubes; EDX mapping condition: 5 kV, 0.7 nA, 15 min, 150,000x
Sample courtesy of Institute for Chemical Research, Kyoto University, Dr. Toshiharu Teranishi