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Hitachi

Hitachi High-Technologies GLOBAL

Batch Type Wet Station

Our system has batch type cleaning ,resist stripping and etching potions.
All processes from chemical cleaning to dryer are fully automated.

Configuration

Features

  • All processes from chemical cleaning to dryer are fully automated.
  • Carrier transfer and carrier loess transfer is selectable
  • You can configure for your application.
  • Layout is In-line type and through-the –wall type.
  • Si wafer, glass substrate, compound wafer and so on is applied.
  • Round wafer and square wafer is applied
  • Dry method is selectable, spin dryer ,IPA vapor dryer and hot blower.
  • inorganic acid inorganic alkali organic acid organic alkali function water can be use
  • You can choose many option ultrasonic cleaning rocking mechanism reversing mechanism

Example


Carrier loess RCA cleaning system


Resist stripping system


Consecutive transfer cleaning system


Dip&Spin cleaning system


Semi-auto cleaning system (front and back)


Manual cleaning system


Carrer RCA cleaning system


Semi-auto cleaning system (right and left)

 

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