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CG6300 offers higher resolution, improved metrology repeatability and image quality.
The newly developed Advanced CD Measurement SEM CG6300 (HITACHI CD-SEM) will offer higher resolution with a fully renewed electron optical system along with improved metrology repeatability and image quality. The electron microscope column is able to select secondary electrons and backscattered electrons emitted from the material depending on the measurement target. In this way, CD-SEM: CG6300 is able to measure the bottom dimensions of deep trenches and holes in via-in-trench*1 BEOL process*2 as well as 3D NAND and DRAM.
|Wafer size||Φ300 mm (SEMI standard V notched wafer)|
|Auto-loader||3 FOUP*3 -compatible random access|
|Power supply||Single-phase AC200 V, 208 V, 230 V, 12 kVA (50/60 Hz)|