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Modern pyramid

© Yoshinori Nakada, Yoshihisa Ohishi (Hitachi Science Systems, Ltd.)
© Hideo Todokoro (Instrument Division, Hitachi, Ltd.)

The picture shows pyramids and a camel in the distance. Everything is in the order of microns. These pyramids were formed by anisotropical etching of silicon substrate which is a common material for making large scale integrated circuits or LSIs. The pyramids were formed along the crystal orientation of (111) of silicon. Modern LSIs are made with higher precision and accuracy beyond those ancient pyramids.

At 55th photo contest hosted by the Japanese Society of Electron Microscopy in 1999.

Condition

  • Specimen : Silicon (100) substrate
  • Instrument : Cold Field Emission Scanning Electron Microscope S-4300
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All information related to these photographers is based on the information when the photo was taken.
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This work was presented at the "photo contest" hosted by the Japanese Society of Microscopy.
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Reproduction or republication without permission prohibited.
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"nanoart" is registered trademark of Hitachi High-Technologies Corporation in Japan.