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Micro-hat

© Yasushi Kuroda, Takahiro Sato, Kiyomi Kawasaki (Hitachi Science Systems, Ltd.)
© Hiroyuki Tanaka (Instruments, Hitachi, Ltd.)

Fantasy in semiconductor device. The micrograph shows a micro-hat made from W(tungsten) with a ribbon made from Titanium nitride.

At 57th photo contest hosted by the Japanese Society of Electron Microscopy in 2001.

Condition

  • Specimen: 64M DRAM
  • Instrument: Ultra-thin Film Evaluation System HD-2000
  • Magnification: × 100,000
  • Accelerating voltage: 200 kV
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All information related to these photographers is based on the information when the photo was taken.
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This work was presented at the "photo contest" hosted by the Japanese Society of Microscopy.
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Reproduction or republication without permission prohibited.
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"nanoart" is registered trademark of Hitachi High-Technologies Corporation in Japan.