Skip to main content

Hitachi

Hitachi High-Technologies GLOBAL

nanoart®

The escape to the glory

© Kouichi Kurosawa, Shuichi Takeuchi, Atsushi Muto, Ryuichiro Tamochi (Hitachi Science Systems, Ltd.)

This cave is an opening for laser beam of SNOM (Scanning Near-field Optical Microscope) processed in FIB (Focused Ion Beam system) in central part of cantilever in fact, it used for the AFM (Atomic Force Microscope). This SNOM is notified in advanced technologies such as nanotechnology as useful analysis tool.

At 59th photo contest hosted by the Japanese Society of Microscopy in 2003.

Condition

  • Specimen: An opening for laser beam of SNOM
  • Instrument: Cold Field Emission Scanning Electron Microscope S-4300
  • Magnification: × 50,000
  • Accelerating voltage: 5 kV
  • Specimen: Courtesy of Nakao Lab., The University of Tokyo.
*
All information related to these photographers is based on the information when the photo was taken.
*
This work was presented at the "photo contest" hosted by the Japanese Society of Microscopy.
*
Reproduction or republication without permission prohibited.
*
"nanoart" is registered trademark of Hitachi High-Technologies Corporation in Japan.