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Sapporo nano Tower

© Yasushi Kuroda, Toshie Yaguchi, Tsuyoshi Ohnishi (Hitachi High-Technologies corporation)
© Yuka Nishimoto (Hitachi High-Tech Fielding corporation)

The micrograph shows a secondary electron(SE) image of the world's smallest tower prepared by a FIB (Focused Ion Beam) technique.
The specimen is extracted from a Si wafer by using a micro-sampling method and mounted on a needle stab of a specimen rotation holder. A towered shape is made by rotating the specimen. Although the FIB was initially developed for fixing and evaluation of semiconductor devices, such micromanipulation technologies have been made a further progress.

First Place (Field 1: Non-biology)
At the 16th International Microscopy Congress (IMC16), Micrograph Competition(2006).

Condition

  • Instrument (Fabrication): Focused Ion Beam System FB-2100
  • Accelerating voltage: 40 kV
  • Instrument (Observation): Ultra-high Resolution Scanning Electron Microscope S-5500
  • Accelerating voltage: 2 kV
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All information related to these photographers is based on the information when the photo was taken.
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This work was presented at the 16th International Microscopy Congress (IMC16), Micrograph Competition.
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Reproduction or republication without permission prohibited.
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"nanoart" is registered trademark of Hitachi High-Technologies Corporation in Japan.