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Hitachi

Hitachi High Technologies in America

Conductor Etch System M-600/6000 Series

M-6000 Series is targeted for deep silicon trench etch of power devices used in mobile systems, home electrical appliances, automobiles, trains, etc.
Low temperature etch technology and TM (Time Modulation) bias technology together with the ECR (Electron Cyclotron Resonance) high density plasma source provide for a clean process, superior trench profiles without sidewall residue, and excellent productivity.

Specification

Applicable wafer diameter 150mm, 200mm
System configuration 2 etch+ 2 ash (max.)
*
These photographs are partially different from actual systems.

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