Skip to main content
The wafer surface inspection system LS series can detect defects on unpatterned wafers with a mirror-finished surface. Applied technology of laser scattering achieves high sensitivity and high throughput detection of small contaminants and various types of defects on wafer surfaces prior to patterning. Wafer surface defects such as shallow scratch flatness defects, water marks, epi stacking faults, protrusions by the polishing process, and flatness defects caused during deposition cause problems in next-generation processes. The LS series achieve high sensitivity by detecting the light scattered from defects while suppressing background noise from the wafer surface. It is widely adopted to control contamination in the manufacturing of semiconductors on the 10-nm scale, and for delivery and incoming wafer quality control.