Semiconductor scaling is continuing at a remarkable rate. The most advanced techniques are being introduced and device structures must now be controlled at the atomic level. To this end, electron microscopy has proved to be indispensable, because it allows high-resolution imaging with a quick turnaround time, and can be applied on different scales ranging from the package level to the atomic level required for the evaluation of controlled gate structures. Hitachi High-Tech provides the most advanced in-line analysis tools for semiconductor development and manufacture, and for device failure analysis and quality assurance. We produce a wide range of electron microscopy solutions, including the world's highest-resolution FE-SEM system, FIB-SEM systems, and TEM systems.
Ultra-High-Resolution Schottky Scanning Electron Microscope SU7000
The SU7000 is designed to allow simultaneous acquisition of multiple secondary and backscattered electron signals, and enables rapid capture of many types of signals.
Ultra-high Resolution Scanning Electron Microscope SU9000Ultra high resolution SEM for process evaluation
Field Emission Transmission Electron Microscope HF5000Hitachi's unique 200 kV aberration-corrected TEM/STEM: the perfect harmony of imaging resolution and analytical performance
Focused Ion and Electron Beam System & Triple Beam System NX2000Ultra thin lamella preparation instrument for TEM observation
Focused Ion and Electron Beam System Ethos NX5000The Hitachi Ethos FIB-SEM incorporates the latest-generation FE-SEM with superb beam brightness and stability. 
Ion Milling System ArBlade 5000The most advanced broad ion beam system for producing exceptionally high-quality cross-section or flat-milling samples for electron microscopy.
Scanning Electron Microscopes SU3800/SU3900Hitachi High-Tech's scanning electron microscopes SU3800/SU3900 deliver both operability and expandability.
Schottky Field Emission Scanning Electron Microscope SU5000High resolution SEM with charged build up control using variable pressure mode.Ultra-High-Resolution Schottky Scanning Electron Microscope SU7000The SU7000 is designed to allow simultaneous acquisition of multiple secondary and backscattered electron signals, and enables rapid capture of many types of signals.Focused Ion and Electron Beam System Ethos NX5000The Hitachi Ethos FIB-SEM incorporates the latest-generation FE-SEM with superb beam brightness and stability. 
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