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Hitachi High-Tech GLOBAL

August 22, 2011

Hitachi High-Tech sues FEI Japan for Patent Infringement

On August 19 2011, Hitachi High-Technologies Corporation (TOKYO:8036, Hitachi High-Tech) filed a lawsuit against FEI Japan at the Tokyo District Court, claiming damages for infringement of Japanese Patent No. 2,774,884* related to the Micro-Sampling technology using Focused Ion Beam, taking the effective period of the same patent into consideration.
Hitachi High-Technologies considers its intellectual property rights as extremely important management resources, and will make every effort to protect such rights.

Japanese Patent No. 2,774,884
On August 12 2011, Intelletual Property High Court dissmissed the appeal filed by FEI Japan. On June 15, 2011, Tokyo District Court made a preliminary injunction order against FEI Japan to stop manufacture, sale and import of Quanta 3D FEG (Equipped with a probe (Omniprobe or Autoprobe) and GIS apparatus* with Platinum Deposition gas, Tungsten Deposition gas, or Carbon Deposition gas). FEI Japan filed an objection to this premilinary injunction order and has filed an appeal before the Intellectual Property High Court. Intellectual Property Hight Court accepted the preliminary injunction order against FEI Japan and dismissed FEI Japan's appeal.
GIS apparatus: Gas Injection System

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