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Hitachi High-Tech GLOBAL


New CD-SEM designed for sub-22nm technology node and beyond.

Advanced CD Measurement SEM CG5000 (HITACHI CD-SEM) delivers High-Resolution, High-Throughput and High-Repeatability by utilizing improved electron optics, advanced image processing and new wafer transfer system.
CG5000 is also capable of enhanced automatic calibration, providing long-term stability.
In addition, CD-SEM CG5000 has new applications and measurement techniques to be able to meet measurement challenges for new process and new materials for 1Xnm process development.


High Productivity

High throughput is achieved by new wafer transfer system, high speed AF, and MAM time reduction by optimizing measurement area using multiple pixels ratio.

High Resolution

CG5000 improves image sharpness by Image Enhancement in order to achieve High-Precision measurements for 1Xnm node patterns.

Long term stability

  • Repeatability improvement
    High Repeatability is achieved by improving electron optics stability.
  • Matching improvements
    Matching between CG5000 models has been improved by utilizing Auto-Calibration Function which can adjust SEM Condition automatically by using a specialized sample on stage, thus improving long term stability of the tools.

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