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Hitachi High-Tech GLOBAL

Defect Review SEM CR7300 Series

Inline Review SEM which contributes yield enhancement with high speed ADR and accurate ADC


  • Enhanced SEM image resolution for cutting-edge device development and mass production
  • New in-situ solution of yield control which is quantified and indicating an Electrical Properties (R / C) in semiconductor process
  • Enhanced productivity which improved  throughput performance by 2x compared to the previous model
  • Contribute to the N3-Generation device development by advanced defect review and analysis function for unpatterned wafers
  • Improved defect classification performance and accuracy remarkably by adopting AI based ADC(Automatic Defect Classification)

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