The ion beam etching machine applies a voltage to the electrically neutral plasma generated in the ion source by means of an accelerating electrode to give it a positive electric potential. And it is an ion beam etching machine that accelerates ions from the electrode holes and collides with the processing material for fine processing.
The unique bucket ion source enables machining with even and parallel beams. We have a wide variety of sizes from small to large, and can be made to order.
It is applied to a variety of applications, including MEMS, sensors, power devices, high-frequency devices, and optical devices, supporting the manufacture of core devices on IoT.
It is a compact device suitable for research and development and small volume production.
This is a mass production machine that processes single wafers using a cassette to cassette.
This is machine for mass production that processes cassette-to-cassette like a batch.
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