The NANOMESH enables users to prepare TEM sample more precisely and easily on the sample mounting locations fabricated with ultrafine and high precision.
The sample can be fixed to the top or side of the sample mounting locations.
The sample mounting locations are made of single crystal silicon. EDX analysis of a Si based sample can be performed accurately since the material back-sputtered from the mounting location support part is silicon.
Redeposition of back sputtered material while FIB thinning can be minimized
| Product Name, Sales Unit | |
|---|---|
| Product Name | NANOMESH |
| Sales Unit | 25 pcs/set |
| Specifications | |
| Thickness of mounting locations | 5 µm |
| Width of mounting locations | 100 µm, 50 µm, 30 µm, and 20 µm |
| Number of mounting locations | 5 |
| Material | Single crystal silicon |
| Base | |
| Thickness | 50 µm |
| Diameter | φ3 mm |
| Material | Molybdenum |
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