The HF-3300 is a 100-300 kV TEM/STEM/SEM powered by Hitachi's state-of-the-art cold field emission technology for high-brightness and high-energy resolution. Capabilities needed for daily material structural characterizations and analysis are provided. Unique electron optical designs include spatially resolved EELS* and double biprism* electron holography (special order). The simultaneous secondary electron imaging and STEM imaging reveal surface and bulk structures at the same time. A special version for gas environmental TEM or aberration-corrected microscopy is available.
Cold field emission electron source benefits nanoscale analysis with its high brightness and high-energy resolution. Its inherent high coherency greatly contributes to ultra-high resolution imaging and electron holography.*
A 300 kV accelerating voltage allows atomic-resolution imaging for thick specimens. Metals and ceramics with high atomic numbers are less electron transparent and often need to be observed at a 300 kV accelerating voltage.
The newly introduced spatially resolved EELS* and the in-situ SEM/TEM imaging* nanobeam electron diffraction provide sophisticated and unique analytical capabilities.
The Hitachi-FIB-compatible specimen holder* requires no tweezer handling of TEM grids between FIB fabrication and TEM observation and ensures high-throughput TEM analysis. Hitachi's unique specimen rotation holder* enables real-time multidirectional structural analysis together with an STEM unit.*
Windows-based TEM/STEM* computer control, a motor-driven movable aperture, and a 5-axis motorized stage make the high-end TEM more accessible. It only takes 10 minutes to be high-voltage-ready and 1 minute for specimen exchange, providing high sample throughput for TEM analysis.
| Items | Description | |
|---|---|---|
| Electron source | W(310) cold field emission electron source | |
| Accelerating voltage | 300 kV, 200 kV*2, 100 kV*2 | |
| Resolution | Lattice | 0.10 nm |
| Point-to-point | 0.19 nm | |
| Information limit | 0.13 nm | |
| Magnification | Low Mag mode | 200 - 500× |
| High Mag mode | 2,000 - 1,500,000× | |
| Image rotation | ±5° or less (High Mag mode, below 1,000,000×) | |
| Specimen tilt | ±15° | |
| Camera length | 300 - 3,000 mm | |
![Au single crystal [110] high resolution TEM image](/image/global/science/products/microscopes/electron-microscope/tem/hf3300_app01.png)
Accelerating voltage : 300 kV
Accelerating voltage ： 100 kV
Accelerating voltage ： 60 kV
Temperature : 200°C
Gas: H2, O2
Accelerating voltage : 300 kV
Gas : H2, O2, Air
Accelerating voltage ： 300 kV
Instrument ： HF-3300S WG-P.P. with B-COR TEM corr.
Data courtesy of CEMES-CNRS, France
Accelerating voltage : 300 kV
Instrument : HF-3300S WG-P.P. with B-COR TEM corr.
Data courtesy of CEMES-CNRS, France
Accelerating voltage : 300 kV
Prepared by NX2000 1 kV Ar ion milling
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