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Hitachi

Analytical Systems, Electron Microscopes & Medical Systems

Photomask Repair System MR8000

Photomask Repair System MR8000

This FPD photomask defect repair system uses focused ion beam (FIB) technology and supports large scale photomasks.
A rotation mechanism inside the chamber minimizes an installation area.

    Features

    1. Supports large flat panel dispray masks
      Can take large photomasks up to a maximum size of 1400 × 1600 mm.
    2. Can deposit high adhesion film
      Can form film with adhesion strength comparable to Cr film on the mask using a special gas.
    3. Can repair gray tone masks
      FIB carbon deposition function allows repair of clear defects in gray-tone masks that use half-tone films.

    Specifications

    Mask sizes Max: 1400× 1600 mm
    Min: 6-inch
    Max thickness: 15 mm
    Min thickness: 5 mm
    Repair accuracy 50 nm @3σ
    Clear defect repair method FIB carbon deposition
    Opaque defect repair method Gas-assisted etching