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This FPD photomask defect repair system uses focused ion beam (FIB) technology and supports large scale photomasks.
A rotation mechanism inside the chamber minimizes an installation area.
|Mask sizes||Max: 1400× 1600 mm
Max thickness: 15 mm
Min thickness: 5 mm
|Repair accuracy||50 nm @3σ|
|Clear defect repair method||FIB carbon deposition|
|Opaque defect repair method||Gas-assisted etching|