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Analytical Systems, Electron Microscopes & Medical Systems


Sapporo nano Tower

Sapporo nano Tower

© Yasushi Kuroda, Toshie Yaguchi, Tsuyoshi Ohnishi (Hitachi High-Tech corporation)
© Yuka Nishimoto (Hitachi High-Tech Fielding corporation)

The micrograph shows a secondary electron(SE) image of the world's smallest tower prepared by a FIB (Focused Ion Beam) technique.
The specimen is extracted from a Si wafer by using a micro-sampling method and mounted on a needle stab of a specimen rotation holder. A towered shape is made by rotating the specimen. Although the FIB was initially developed for fixing and evaluation of semiconductor devices, such micromanipulation technologies have been made a further progress.

First Place (Field 1: Non-biology)
At the 16th International Microscopy Congress (IMC16), Micrograph Competition(2006).


  • Instrument (Fabrication): Focused Ion Beam System FB-2100
  • Accelerating voltage: 40 kV
  • Instrument (Observation): Ultra-high Resolution Scanning Electron Microscope S-5500
  • Accelerating voltage: 2 kV
All information related to these photographers is based on the information when the photo was taken.
This work was presented at the 16th International Microscopy Congress (IMC16), Micrograph Competition.
Reproduction or republication without permission prohibited.
"nanoart" is registered trademark of Hitachi High-Tech Corporation in Japan.