参考文献・発表リスト

2019年

Focused ion beam system equipped with gas field ion source for industrial application

Anto Yasaka, F. Aramaki, T. Kozakai, O. Matsuda, K. Shiina and Y. Kawanami
The 22nd International Conference on Secondary Ion Mass Spectrometry (SIMS-22), Kyoto, Japan, 2019, 25-3-I1

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2017年

Mask Repair Technology Using Gas Field Ion Source

Anto Yasaka, Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda, Kensuke Shiina, Koji Nagahara
2017 MRS Fall Meeting & Exhibit, Boston, Massachusetts, TC03.11.01

Mask Repair Technology using Gas Field Ion Source

Anto Yasaka, Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda
第64回春季応用物理学会学術講演会講演予稿集,E16p-315-3 (2017)

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2016年

Mask Repair Technology using Gas Field Ion Source

A. Yasaka, F. Aramaki, T. Kozakai, O. Matsuda
AVS 63rd International Symposium & Exhibition HI+MI+NS-ThA-1

Nanoscale Imaging and Fabricatin by Focused Ion Beam System Equipped with Gas Field Ion SourceNanoscale Imaging and Fabrication by Focused Ion Beam System Equipped with Gas Field Ion Source

T. Kozakai, O. Matsuda
The 29th International Microprocesses and Nanotechnology Conference (MNC2016), Kyoto, Japan, 9C-2-1

Nanoscale Imaging, Material Removal and Deposition for Fabrication of Cutting-edge Semiconductor Devices

Anto Yasaka, Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda
Hitachi Review, Vol.65 No.7

ナノレベルの「見る」，「削る」，「付ける」技術で 最先端半導体デバイス製造に貢献する -イオンビームによるフォトマスク欠陥修正技術-

八坂行人、荒巻文朗、小堺智一、松田修
日立評論2016年5月号

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2015年

Photomask repair technology by using gas field ion source

A. Yasaka, F. Aramaki, T. Kozakai, O. Matsuda, K. Shiina, H. Oba, Y. Sugiyama, K. Aita, and M. Muramatsu
Gas Ion Microscopy Workshop 2015, Trinity College, Dublin, Ireland

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2014年

Performance of GFIS mask repair　system for various mask materials

Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda, Anto Yasaka, Hitachi High-Tech Science Corporation, 36-1 Takenoshita, Oyama-cho, Sunto-gun,Shizuoka 410-1393, Japan
Shingo Yoshikawa, Koichi Kanno, Hiroyuki Miyashita, Naoya Hayashi, Dai Nippon Printing Co., Ltd., 2-2-1 Fukuoka, Fujimino-shi, Saitama 356-8507, Japan, Performance of GFIS mask repair　system for various mask materials, Proc. SPIE 9235, Photomask Technology 2014, 92350F (October 21, 2014),

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2012年

Photomask Repair Technology by using Gas Field Ion Source

F.Aramaki, T.Kozakai, O.Matsuda, O.Takaoka, Y.Sugiyama, H.Oba, K.Aita, A.Yasaka, Photomask Repair Technology by using Gas Field Ion Source, Photomask Japan 2012

Repair Technology for Large Scale Photomasks

F.Aramaki, T.Kozakai, Y.Nakagawa, Y.Koyama, M.Aso, H.Momota, H.Takiguchi, M.Okabe, M.Muramatsu, Repair Technology for Large Scale Photomasks, Photomask Japan 2012

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2011年

EUVLマスク修正のための新しいFIB技術の開発

荒巻文朗、松田修、小堺智一、大庭弘、杉山安彦、八坂行人、天野剛、茂村弘之、須賀治, EUVLマスク修正のための新しいFIB技術の開発, NGLワークショップ2011

Development of new FIB technology for EUVL mask repair

F.Aramaki, T.Ogawa, O.Matsuda, T.Kozakai, Y.Sugiyama, H.Oba, A.Yasaka, T.Amano, H.Shigemura, O.Suga, Development of new FIB technology for EUVL mask repair, SPIE Advanced Lithography 2011

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2010年

Nanotweezers for removing nanoparticles on EUVL masks

F.Aramaki, T.Umemoto, M.Yasutake, H.Shigemura, O.Suga, Nanotweezers for removing nanoparticles on EUVL masks, International Symposium on Extreme Ultraviolet Lithography

Reflective multi-layer etching for repairing clear defect on EUV masks using FIB

T.Amano, H.Shigemura, N.Takagi, T.Terasawa, O.Suga, T.Kozakai, F.Aramaki, A.Yasaka, Y. Inazuki, N.Hayashi, Reflective multi-layer etching for repairing clear defect on EUV masks using FIB, International Symposium on Extreme Ultraviolet Lithography

Study of EUV mask defect repair using FIB method

T.Amano, N.Takagi, H.Shigemura, T.Terasawa, O.Suga, K.Shiina, F.Aramaki, A.Yasaka, Y. Inazuki, N.Hayashi, Study of EUV mask defect repair using FIB method, Photomask Technology 2010

FIB-CVD technology for EUV mask repair

Tsuyoshi Amano, Noriaki Takagi, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Tomokazu Kozakai, Osamu Matsuda, Anto Yasaka, FIB-CVD technology for EUV mask repair, Photomask Japan 2010

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2009年

Nanotweezers as a particle removal tool for EUVL masks

Takeshi Umemoto, Masatoshi Yasutake, Fumio Aramaki, Hiroyuki Shigemura, Osamu Suga, Nanotweezers as a particle removal tool for EUVL masks, Photomask Japan 2009

FIB mask repair technology for EUV mask

Tsuyoshi Amano, Yasushi Nishiyama, Hiroyuki Shigemura, Tsuneo Terasawa, Osamu Suga, Kensuke Shiina, Fumio Aramaki, Anto Yasaka, Tsukasa Abe, Hiroshi Mohri, FIB mask repair technology for EUV mask, Photomask Japan 2009

ナノピンセット：EUVLへの応用

梅基 毅、安武 正敏、荒巻 文朗、"ナノピンセット：EUVLへの応用", クリーンテクノロジー(日本工業出版), 12月号(2009)

Removal Method of Nano-Cut Debris for Photomask Repair Using an Atomic Force Microscopy System

Futoshi Iwata, Kazutaka Saigo, Toshihiko Asao, Masatoshi Yasutake, Osamu Takaoka, Takuya Nakaue, Shuichi Kikuchi, "Removal Method of Nano-Cut Debris for Photomask Repair Using an Atomic Force Microscopy System", Japanese Journal of Applied Physics 48 (2009)

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2008年

Ga implantation and interlayer mixing during FIB repair of EUV mask defects

Yasushi Nishiyama; Tsuyoshi Amano; Hiroyuki Shigemura; Tsuneo Terasawa; Osamu Suga; Tomokazu Kozakai; Fumio Aramaki; Kensuke Shiina; Anto Yasaka; Ryoji Hagiwara, Ga implantation and interlayer mixing during FIB repair of EUV mask defects, Photomask Technology 2008

Study of EUVL mask defect repair using FIB-GAE method

Tsuyoshi Amano; Yasushi Nishiyama; Hiroyuki Shigemura; Tsuneo Terasawa; Osamu Suga; Kensuke Shiina; Fumio Aramaki; Ryoji Hagiwara; Anto Yasaka, Study of EUVL mask defect repair using FIB-GAE method, Photomask Technology 2008

EUVLマスク欠陥のFIB-GAE修正プロセス開発

天野剛、西山泰史、茂村弘之、寺澤恒男、須賀治、椎名健介、荒巻文朗、八坂行人, EUVLマスク欠陥のFIB-GAE修正プロセス開発, NGLワークショップ2008

Damage analysis of EUV mask under Ga focused ion beam irradiation

Yasushi Nishiyama; Tsuyoshi Amano; Hiroyuki Shigemura; Tsuneo Terasawa; Osamu Suga; Tomokazu Kozakai; Syuichi Kikuchi; Kensuke Shiina; Anto Yasaka; Ryoji Hagiwara, Damage analysis of EUV mask under Ga focused ion beam irradiation, Photomask Japan 2008

Evaluation of defect repair of EUVL mask pattern using FIB-GAE method

Tsuyoshi Amano; Yasushi Nishiyama; Hiroyuki Shigemura; Tsuneo Terasawa; Osamu Suga; Ryoji Hagiwara; Kensuke Shiina; Shuichi Kikuchi; Anto Yasaka, Evaluation of defect repair of EUVL mask pattern using FIB-GAE method, Photomask Japan 2008

自己検知型カンチレバーを用いた液中ＡＦＭ観察法

西郷和隆, 石川恒志, 中上卓哉, 高岡修, 安武正敏, 菊池修一, 牛木辰男, 岩田　太, 自己検知型カンチレバーを用いた液中ＡＦＭ観察法, 春季第55回応用物理学関係連合講演会

Advanced Photomask Defect Repairing Technology Using FIB and SPM

O. Takaoka, “Advanced Photomask Defect Repairing Technology Using FIB and SPM”, Int. J. of Automation Technology, Vol.2, pp66-69(2008)

45nmノード対応フォトマスク欠陥修正装置

萩原良二, 高岡修 "45nmノード対応フォトマスク欠陥修正装置", 電子材料（工業調査会）,3月号（2008）

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2007年

高精度微細加工用AFMカンチレバーの開発

中上卓哉, 高岡修, 浜尾尚範, 渡邉将史, 安武正敏, 渡邉直哉, 白川部喜春，八坂行人, 高精度微細加工用ＡＦＭカンチレバーの開発, 秋季第68回応用物理学会学術講演会

ナノ加工粉除去装置の開発とAFMナノ振動切削プロセスにおける効果

西郷和隆,浅尾 俊彦, 岩田 太, 佐々木 彰, 中上 卓哉, 安武 正敏, 高岡 修, 菊池 修一, ナノ加工粉除去装置の開発とAFMナノ振動切削プロセスにおける効果, 精密工学会秋季大会学術講演会

AFMナノスケール振動切削を用いたフォトマスクリペア技術の開発

浅尾 俊彦, 瀬田 翔平, 岩田 太, 佐々木 彰, 中上 卓哉, 安武 正敏, 高岡 修, 菊池 修一, AFMナノスケール振動切削を用いたフォトマスクリペア技術の開発, 精密工学会春季大会学術講演会

A semi-automated AFM photomask repair process for manufacturing application using SPR6300

M. Dellagiovanna, H. Miyashita, H. Yoshioka, S. Murai, T. Nakaue, O. Takaoka, S. Kikuchi, R. Hagiwara, and S. Benard, A semi-automated AFM photomask repair process for manufacturing application using SPR6300, Photomask Technology 2007

A semi-automated AFM photomask repair process for manufacturing application using SPR6300

M. Dellagiovanna, H. Miyashita, H. Yoshioka, S. Murai, T. Nakaue, O. Takaoka, S. Kikuchi, R. Hagiwara, and S. Benard, “A semi-automated AFM photomask repair process for manufacturing application using SPR6300”, Proc. of SPIE Vol.6730, pp673021-1- pp673021-11(2007)

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2006年

FIBとSPMを用いたフォトマスク欠陥修正技術

高岡修, FIBとSPMを用いたフォトマスク欠陥修正技術, 精密工学会超精密位置決め専門委員会定例会

Advanced Photomask Repair Technology for 65nm Lithography (6)

F. Aramaki, T. Kozakai, M. Muramatsu, Y. Sugiyama, Y. Koyama, O. Matsuda, K. Suzuki, M. Okabe, T. Doi, R. Hagiwara, T. Adachi, A. Yasaka, Y. Tanaka, O. Suga, N. Nishida, and Y. Usui, Advanced Photomask Repair Technology for 65nm Lithography (6), Photomask Technology 2006

Advanced Photomask Repair Technology for 65nm Lithography (5)

F. Aramaki, T. Kozakai, M. Muramatsu, Y. Sugiyama, Y. Koyama, O. Matsuda, K. Suzuki, M. Okabe, T. Doi, R. Hagiwara, T. Adachi, A. Yasaka, Y. Tanaka, O. Suga, N. Nishida, and Y. Usui, Advanced Photomask Repair Technology for 65nm Lithography (5), Photomask Japan 2006

Advanced Photomask Repair Technology for 65nm Lithography (5)

F. Aramaki, T. Kozakai, M. Muramatsu, Y. Sugiyama, Y. Koyama, O. Matsuda, K. Suzuki, M. Okabe, T. Doi, R. Hagiwara, T. Adachi, A. Yasaka, Y. Tanaka, O. Suga, N. Nishida, and Y. Usui, “Advanced Photomask Repair Technology for 65nm Lithography (5)”, Proc. of SPIE, Vol.6283, pp628310-1-628310-8(2006)

Advanced Photomask Repair Technology for 65nm Lithography (6)

F. Aramaki, T. Kozakai, M. Muramatsu, Y. Sugiyama, Y. Koyama, O. Matsuda, K. Suzuki, M. Okabe, T. Doi, R. Hagiwara, T. Adachi, A. Yasaka, Y. Tanaka, O. Suga, N. Nishida, and Y. Usui, “Advanced Photomask Repair Technology for 65nm Lithography (6)”, Proc. of SPIE, Vol.6349, pp63491E-1-63491E-7(2006)

FIBとSPMを用いたフォトマスク欠陥修正技術

高岡修, “FIBとSPMを用いたフォトマスク欠陥修正技術”, 超精密位置決め専門委員会定例会講演前刷集, No.2006-2, pp11-18(2006)

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2005年

Advanced Photomask Repair Technology for 65nm Lithography (4)

Y. Itou, Y. Tanaka, O. Suga, Y. Sugiyama, R. Hagiwara, H. Takahashi, O. Takaoka, T. Kozakai, O. Matsuda, K. Suzuki, M. Okabe, S. Kikuchi, A. Uemoto, A. Yasaka, T. Adachi, and N. Nishida, Advanced Photomask Repair Technology for 65nm Lithography (4), 25th Annual BACUS Symposium

Advanced Photomask Repair Technology for 65nm Lithography (3)

Y. Itou, Y. Tanaka, O. Suga, Y. Sugiyama, R. Hagiwara, H. Takahashi, O. Takaoka, T. Kozakai, O. Matsuda, K. Suzuki, M. Okabe, S. Kikuchi, A. Uemoto, A. Yasaka, T. Adachi, and N. Nishida, Advanced Photomask Repair Technology for 65nm Lithography (3), Photomask Japan 2005

Advanced Photomask Repair Technology for 65nm Lithography (3)

Y. Itou, Y. Tanaka, O. Suga, Y. Sugiyama, R. Hagiwara, H. Takahashi, O. Takaoka, T. Kozakai, O. Matsuda, K. Suzuki, M. Okabe, S. Kikuchi, A. Uemoto, A. Yasaka, T. Adachi, and N. Nishida, “Advanced Photomask Repair Technology for 65nm Lithography (3)”, Proc. of SPIE, Vol.5853, pp1000-1008(2005)

Advanced Photomask Repair Technology for 65nm Lithography (4)

Y. Itou, Y. Tanaka, O. Suga, Y. Sugiyama, R. Hagiwara, H. Takahashi, O. Takaoka, T. Kozakai, O. Matsuda, K. Suzuki, M. Okabe, S. Kikuchi, A. Uemoto, A. Yasaka, T. Adachi, and N. Nishida, “Advanced Photomask Repair Technology for 65nm Lithography (4)”, Proc. of SPIE, Vol.5992, pp59924Y-1-59924Y-8(2005)

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2004年

FIB Mask Repair Technology for Electron Projection Lithography

Y. Yamamoto, M. Hasuda, H. Suzuki, M. Sato, O. Takaoka, H. Matsumura, N. Matsumoto, K. Iwasaki, R. Hagiwara, K. Suzuki, Y. Ikku, K. Aita, T.Kaito, T. Adachi, A. Yasaka, FIB Mask Repair Technology for Electron Projection Lithography, Photomask Japan 2004

Advanced Photomask Repair Technology for 65nm Lithography (2)

Y. Itou, Y. Tanaka, N. Yoshioka, Y. Sugiyama, R. Hagiwara, H. Takahashi, O. Takaoka, T. Kozakai, O. Matsuda, K. Suzuki, M. Okabe, S. Kikuchi, A. Uemoto, A. Yasaka, T. Adachi, N. Nishida, and T. Ozawa, Advanced Photomask Repair Technology for 65nm Lithography (2), 24th Annual BACUS Symposium

Advanced Photomask Repair Technology for 65nm Lithography (1)

Y. Itou, Y. Tanaka, N. Yoshioka, Y. Sugiyama, R. Hagiwara, H. Takahashi, O. Takaoka, J. Tashiro, K. Suzuki, M. Okabe, S. Kikuchi, A. Uemoto, A. Yasaka, T. Adachi, N. Nishida, and T. Ozawa, Advanced Photomask Repair Technology for 65nm Lithography (1), Photomask Japan 2004

Advanced Photomask Repair Technology for 65nm Lithography (1)

Y. Itou, Y. Tanaka, N. Yoshioka, Y. Sugiyama, R. Hagiwara, H. Takahashi, O. Takaoka, J. Tashiro, K. Suzuki, M. Okabe, S. Kikuchi, A. Uemoto, A. Yasaka, T. Adachi, N. Nishida, and T. Ozawa, “Advanced Photomask Repair Technology for 65nm Lithography (1)”, Proc. of SPIE, Vol.5446, pp301-312(2004)

Advanced Photomask Repair Technology for 65nm Lithography (2)

Y. Itou, Y. Tanaka, N. Yoshioka, Y. Sugiyama, R. Hagiwara, H. Takahashi, O. Takaoka, T. Kozakai, O. Matsuda, K. Suzuki, M. Okabe, S. Kikuchi, A. Uemoto, A. Yasaka, T. Adachi, N. Nishida, and T. Ozawa, “Advanced Photomask Repair Technology for 65nm Lithography (2)”, Proc. of SPIE, Vol.5567, pp1132-1143(2004)

FIB Mask Repair Technology for Electron Projection Lithography

Y. Yamamoto, M. Hasuda, H. Suzuki, M. Sato, O. Takaoka, H. Matsumura, N. Matsumoto, K. Iwasaki, R. Hagiwara, K. Suzuki, Y. Ikku, K. Aita, T.Kaito, T. Adachi, A. Yasaka, “FIB Mask Repair Technology for Electron Projection Lithography”, Proc. of SPIE, Vol.5446, pp348-356(2004)

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2003年

Advanced Photomask Repair Technology for 90nm/ArF Lithography (3)

Y. Tanaka, Y. Itou, N. Yoshioka, R. Hagiwara, A.Yasaka, O. Takaoka, T. Kozakai, Y. Koyama, H. Sawaragi, Y. Sugiyama, M. Muramatsu, T. Doi, K. Suzuki, M.Okabe, M. Shinohara, O. Matsuda, K. Aita, T. Adachi, Y. Morikawa, M. Nishiguchi, Y. Satoh, and N. Hayashi, Advanced Photomask Repair Technology for 90nm/ArF Lithography (3), 23rd Annual BACUS Symposium

Advanced Photomask Repair Technology for 100nm/ArF Lithography (2)

R. Hagiwara, A. Yasaka, K. Aita, O. Takaoka, Y. Koyama, T. Kozakai, T. Doi, M. Muramatsu, K. Suzuki, Y. Sugiyama, O. Matsuda, M. Okabe, S. Shinohara, M. Hasuda, T. Adachi, Y. Morikawa, M. Nishiguchi, Y. Satoh, N. Hayashi, T. Ozawa, Y. Tanaka, and N. Yoshioka, Advanced Photomask Repair Technology for 100nm/ArF Lithography (2), Photomask Japan 2003

集束イオンビームによるマスク修正技術

八坂行人, 萩原良二, 高岡修, 小山喜弘, 中川良知, 荒巻文朗, 小堺智一, 松田修, 相田和男, 土井利夫, 村松正司, 鈴木勝美, 山本洋, 鈴木浩之, 篠原正至, 荷田昌克, 集束イオンビームによるマスク修正技術, NGL2003次世代リソグラフィワークショップ

Advanced Photomask Repair Technology for 100nm/ArF Lithography (2)

R. Hagiwara, A. Yasaka, K. Aita, O. Takaoka, Y. Koyama, T. Kozakai, T. Doi, M. Muramatsu, K. Suzuki, Y. Sugiyama, O. Matsuda, M. Okabe, S. Shinohara, M. Hasuda, T. Adachi, Y. Morikawa, M. Nishiguchi, Y. Satoh, N. Hayashi, T. Ozawa, Y. Tanaka, and N. Yoshioka, “Advanced Photomask Repair Technology for 100nm/ArF Lithography (2)”, Proc. of SPIE, Vol.5130, pp510-519(2003)

Advanced Photomask Repair Technology for 90nm/ArF Lithography (3)

Y. Tanaka, Y. Itou, N. Yoshioka, R. Hagiwara, A.Yasaka, O. Takaoka, T. Kozakai, Y. Koyama, H. Sawaragi, Y. Sugiyama, M. Muramatsu, T. Doi, K. Suzuki, M.Okabe, M. Shinohara, O. Matsuda, K. Aita, T. Adachi, Y. Morikawa, M. Nishiguchi, Y. Satoh, and N. Hayashi, “Advanced Photomask Repair Technology for 90nm/ArF Lithography (3)”, Proc. of SPIE, Vol.5256, pp526-537(2003)

集束イオンビームによるマスク修正技術

八坂行人, 萩原良二, 高岡修, 小山喜弘, 中川良知, 荒巻文朗, 小堺智一, 松田修, 相田和男, 土井利夫, 村松正司, 鈴木勝美, 山本洋, 鈴木浩之, 篠原正至, 荷田昌克, “集束イオンビームによるマスク修正技術”, NGL2003次世代リソグラフィワークショップ予稿集, pp126-128(2003)

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2002年

Advanced Photomask Repair Technology for 100nm/ArF Lithography

R. Hagiwara, A. Yasaka, K. Aita, O. Takaoka, Y. Koyama, T. Kozakai, T. Doi, M. Muramatsu, K. Suzuki, Y. Sugiyama, H. Sawaragi, M. Okabe, S. Shinohara, M. Hasuda, T. Adachi, Y. Morikawa, M. Nishiguchi, Y. Satoh, N. Hayashi, T. Ozawa, Y. Tanaka, and N. Yoshioka, Advanced Photomask Repair Technology for 100nm/ArF Lithography, 22nd Annual BACUS Symposium

Advanced Photomask Repair Technology for 100nm/ArF Lithography

R. Hagiwara, A. Yasaka, K. Aita, O. Takaoka, Y. Koyama, T. Kozakai, T. Doi, M. Muramatsu, K. Suzuki, Y. Sugiyama, H. Sawaragi, M. Okabe, S. Shinohara, M. Hasuda, T. Adachi, Y. Morikawa, M. Nishiguchi, Y. Satoh, N. Hayashi, T. Ozawa, Y. Tanaka, and N. Yoshioka, “Advanced Photomask Repair Technology for 100nm/ArF Lithography ”, Proc. of SPIE, Vol.4889, pp1056-1064(2002)

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2001年

Advanced FIB mask repair technology in ArF lithography 3

R.Hagiwara, A.Yasaka, O.Takaoka, T.Kozakai, S.Yabe, Y.Koyama, M.Muramatsu, T.Doi, K.Suzuki, M.Okabe, K.Aita, T.Adachi, s.Kubo, N.Yoshioka, H.Morimoto, Y.Morikawa, K.Iwase, N.Hayashi, Advanced FIB mask repair technology in ArF lithography 3, Photomask Japan 2001

Advanced Photomask Repair Technology for ArF Lithography (2)

S. Kubo, K. Hiruta, H. Morimoto, A. Yasaka, R. Hagiwara, T. Adachi, Y. Morikawa, K. Iwase and N. Hayashi, “Advanced Photomask Repair Technology for ArF Lithography (2)”, Proc. of SPIE, Vol.4186, pp158-164(2001)

Advanced Photomask Repair Technology for ArF Lithography (3)

R. Hagiwara, A. Yasaka, O. Takaoka, T. Kozakai, S. Yabe, Y. Koyama, M. Muramatsu, T. Doi, K. Suzuki, M . Okabe, K. Aita, T. Adachi, S. Kubo, N. Yoshioka, H. Morimoto, Y. Morikawa, K. Iwase, and N. Hayashi, “Advanced Photomask Repair Technology for ArF Lithography (3)”, Proc. of SPIE, Vol.4409, pp555-562(2001)

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2000年

Advanced FIB mask repair technology in ArF lithography 2

S.Kubo, K.Hiruta, H.Morimoto, A.Yasaka, R.Hagiwara, T.Adachi, Y.Morikawa, K.Iwase, N.Hayashi, Advanced FIB mask repair technology in ArF lithography 2, 20th BACUS symposium

Advanced FIB mask repair technology in ArF lithography

K.Hiruta, S.Kubo, H.Morimoto, A.Yasaka, R.Hagiwara, T.Adachi, Y.Morikawa, K.Iwase, N.Hayashi, Advanced FIB mask repair technology in ArF lithography, Photomask Japan 2000

Advanced Photomask Repair Technology for ArF Lithography

K. Hiruta, S. Kubo, H. Morimoto, A. Yasaka, R. Hagiwara, T. Adachi, Y. Morikawa, K. Iwase and N. Hayashi, “Advanced Photomask Repair Technology for ArF Lithography”, Proc. of SPIE, Vol.4066, pp522-530(2000)

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1999年

FIB mask repair technology

A.Yasaka, FIB mask repair technology, SEMI Technology Symposium '99

Development of focused ion-beam repair for opaque defects on MoSi-based attenuated phase-shift mask

Nishida, Naoki; Nishio, Yasuyuki; Kinoshita, Hiroshi; Takaoka, Osamu; Kozakai, Tomokazu; Aita, Kazuo, Development of focused ion-beam repair for opaque defects on MoSi-based attenuated phase-shift mask, Photomask Japan 99

Development of focused-ion beam repair for opaque defects on MoSi-based attenuated phase-shift mask

N. Nishida, Y. Nishio, H. Kinoshita, O. Takaoka, T. Kozakai, and K. Aita, “Development of focused-ion beam repair for opaque defects on MoSi-based attenuated phase-shift mask”, Proc. of SPIE, Vol.3748, pp599-608(1999)

FIB mask repair technology

A. yasaka, “FIB mask repair technology”, SEMI Technology Symposium '99, pp3-70 (1999)

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1998年

FIB mask repair for MoSi-based PSMs

T.Adachi, O.Takaoka, K.Aita, A.Yasaka, FIB mask repair for MoSi-based PSMs, High-throughput Charged-particle lithography workshop, 98

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1997年

Recent topics in FIB mask repair

A. Yasaka, Recent topics in FIB mask repair, High-throughput Charged-particle lithography workshop, 97

Repair system for future mask fabrication

A. Yasaka, Repair system for future mask fabrication, 3rd symposium on 193nm lithography

Advanced photomask reconstruction with the Seiko SIR 3000

S. Ruatta, E. Smith, A. Yasaka, Advanced photomask reconstruction with the Seiko SIR 3000, 17th BACUS symposium

『集束イオンビーム装置』

岩崎、杉山、小山、八坂、足立、『集束イオンビーム装置』、1998年版電子材料別冊超LSI製造試験装置ガイドブック p.197(1997)

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1996年

Recent progress in repair accuracy of the focused ion-beam mask repair system

Aita, Kazuo; Yasaka, Anto; Kitamura, Tadashi; Matsumura, Hiroshi; Satoh, Yasushi, Nakamura, Hiroshi, Fujikawa, Junji; Tsuchiya, Katsuhide, Noguchi, Shigeru, Recent progress in repair accuracy of the focused ion-beam mask repair system, Photomask Japan 96

Performance of gas-assisted FIB repair for opaque defects

Yasushi Satoh, Hiroshi Nakamura,Junji Fujikawa, Katsuhide Tsuchiya, Shigeru Noguchi, Kazuo Aita, Anto Yasaka, Performance of gas-assisted FIB repair for opaque defects, 16th BACUS symposium

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1995年

New technique for repairing opaque defects

Aita, Kazuo; Koyama, Yoshihiro; Matsumura, Hiroshi; Kaito, Takashi; Satoh, Yasushi; Tsuchiya, Katsuhide; Noguchi, Shigeru, New technique for repairing opaque defects, Photomask Japan 95

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1991年

『集束イオンビーム装置』

八坂、皆藤、足立、『集束イオンビーム装置』、1992年版電子材料別冊超LSI製造試験装置ガイドブック p.87(1991)

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1990年

Experimental study on the influence of liquid metal ion source energy distribution on focused ion beam induced deposition

A.Yasaka, T.Yamaoka, T.Kaito, T.Adachi, Experimental study on the influence of liquid metal ion source energy distribution on focused ion beam induced deposition, Second Japan-US Seminar on Focused ion Beams and Applications

Ga液体金属イオン源のエネルギー分布のヒーターパワー依存性

山岡、八坂, Ga液体金属イオン源のエネルギー分布のヒーターパワー依存性, 90年秋季応用物理学会学術講演会

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1987年

Recent progress on etching technology with focused ion beam in photomask repair

Y.Nakagawa, S.Sasaki, M.Sato, J.Glanville, M.Yamamoto, Recent progress on etching technology with focused ion beam in photomask repair, Japan-US Seminar on Focused Ion Beam Technology and Applications

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1986年

Submicron mask repair using focused ion beam technology

M.Yamamoto, M.Sato, H.kyogoku, K.Aita, Y.Nakagawa, A.Yasaka, R.Takasawa, O.Hattori, Submicron mask repair using focused ion beam technology, SPIE, Electron-Beam, X-ray, & Ion-Beam Techniques for submicronmeter lithographies V

Submicron mask repair using focused ion beam technology

M.Yamamoto, M.Sato, H.kyogoku, K.Aita, Y.Nakagawa, A.Yasaka, R.Takasawa, O.Hattori, Submicron mask repair using focused ion beam technology, 17th理研シンポジウム　Ion implantation and Submicron Fabrication

『SIR-1000フォトマスクリペア装置』

山本、『SIR-1000フォトマスクリペア装置』、月刊Semiconductor World 1月号 p.97(1986)

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1985年

Mask repair using focused ion beam

Takashi Kaito and Masahiro Yamamoto, Mask repair using focused ion beam, 9th Symposium on Ion Source and Ion-Assisted Technology(ISIAT 85)

Mask repair using focused ion beam

Takashi Kaito and Masahiro Yamamoto, Mask repair using focused ion beam, 9th Symposium on Ion Source and Ion-Assisted Technology(ISIAT 85)

『集束イオンビーム装置』

相田、佐藤、山本、『集束イオンビーム装置』、1986年版電子材料別冊LSI製造試験装置ガイドブック p.115(1985)

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1984年

集束イオンビームCVDによるカーボン膜パターンの形成

皆藤、中川、佐藤、山本, 集束イオンビームCVDによるカーボン膜パターンの形成, 84年第45回秋期応用物理学会学術講演会

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