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Hitachi

Hitachi High-Technologies in Korea

Field Emission Transmission Electron Microscope HF-3300

The HF-3300 is a 100-300 kV TEM/STEM/SEM powered by Hitachi's state-of-the-art cold field emission technology for high-brightness and high-energy resolution. Capabilities needed for daily material structural characterizations and analysis are provided. Unique electron optical designs include spatially resolved EELS* and double biprism* electron holography (special order). The simultaneous secondary electron imaging and STEM imaging reveal surface and bulk structures at the same time. A special version for gas environmental TEM or aberration-corrected microscopy is available.

Features

High-brightness Cold Field Emission (Cold FE) electron source

Cold field emission electron source benefits nanoscale analysis with its high brightness and high-energy resolution. Its inherent high coherency greatly contributes to ultra-high resolution imaging and electron holography.*

300 kV accelerating voltage

A 300 kV accelerating voltage allows atomic-resolution imaging for thick specimens. Metals and ceramics with high atomic numbers are less electron transparent and often need to be observed at a 300 kV accelerating voltage.

Unique analytical capabilities

The newly introduced spatially resolved EELS* and the in-situ SEM/TEM imaging* nanobeam electron diffraction provide sophisticated and unique analytical capabilities.

Holder linkage with the FIB system*

The Hitachi-FIB-compatible specimen holder* requires no tweezer handling of TEM grids between FIB fabrication and TEM observation and ensures high-throughput TEM analysis. Hitachi's unique specimen rotation holder* enables real-time multidirectional structural analysis together with an STEM unit.*

User-friendly operation

Windows-based TEM/STEM* computer control, a motor-driven movable aperture, and a 5-axis motorized stage make the high-end TEM more accessible. It only takes 10 minutes to be high-voltage-ready and 1 minute for specimen exchange, providing high sample throughput for TEM analysis.

*:
Optional accessory

Specifications

ItemsDescription
Electron source W(310) cold field emission electron source
Accelerating voltage 300 kV, 200 kV*2, 100 kV*2
ResolutionLattice 0.10 nm
Point-to-point 0.19 nm
Information limit 0.13 nm
MagnificationLow Mag mode 200 - 500×
High Mag mode 2,000 - 1,500,000×
Image rotation ±5° or less (High Mag mode, below 1,000,000×)
Specimen tilt ±15°
Camera length 300 - 3,000 mm
*1
Specification at 300kV
*2
Optional accessory

Application Data

Materials Science

Au single crystal [110] high resolution TEM image

Au single crystal [110] high resolution TEM image
Accelerating voltage : 300 kV

MWCNT high resolution TEM image

MWCNT high resolution TEM image
Accelerating voltage : 100 kV

Graphene high resolution TEM image

Graphene high resolution TEM image
Accelerating voltage : 60 kV

Pt/C catalyst in situ gas-injecting SEM & STEM observation

Pt/C catalyst in situ gas-injecting SEM & STEM observation
Temperature : 200°C
Gas: H2, O2

Gas atmosphere EELS spectrum acquisition

Gas atmosphere EELS spectrum acquisition
Accelerating voltage : 300 kV
Gas : H2, O2, Air

Crocidolite (asbestos) fiber HR Lorentz TEM image

Crocidolite (asbestos) fiber HR Lorentz TEM image
Accelerating voltage : 300 kV
Instrument : HF-3300S WG-P.P. with B-COR TEM corr.
Data courtesy of CEMES-CNRS, France

Fe nanocube HR Lorentz phase reconstructed image

Fe nanocube HR Lorentz phase reconstructed image
Accelerating voltage : 300 kV
Instrument : HF-3300S WG-P.P. with B-COR TEM corr.
Data courtesy of CEMES-CNRS, France

Semiconductors

Cross sectional TEM image of 22 nm node FinFET

Gas atmosphere EELS spectrum acquisition
Accelerating voltage : 300 kV
Prepared by NX2000 1 kV Ar ion milling

HHT employee contributed to a paper published on "Nature communications", with HF-3300 expertise New !

Joint paper helped to Tohoku University Graduate School of Science of the group of efforts, I will introduce that was published in "Nature Communications" of October 22, 2013 issue.

Hitachi 300 kV HF-3300 In situ SEM/STEM Observation Work Won a Poster Award in RSC Tokyo Int'l Conference 2013

JASIS 2013 was held in (9 / 4-6) period, in a flash presentation and poster session of the international conference "RSC Tokyo International Conference 2013" (Royal Society of sponsored), posters that the Hitachi High-Tech announced, Poster Award I was awarded the.

Applications(Global)

Hitachi TEM Application Data

Technical magazine
"SI NEWS"

This journal addresses a wide range variety of research papers and useful application data using Hitachi science instruments.

nanoart(Global)

Photo collections of beauty of metals, minerals, organisms etc. reproduced by the electron microscope and finished more beautifully by computer graphic technology.

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