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Hitachi

Hitachi High-Tech in Korea

  • Effective for organic matter removal, surface modification and surface roughening of film and glass substrates
  • Suitable for processing finer than corona discharge
  • Corresponds to R2R system
  • 3 different type of method ~ Direct method / Remote method / Arc Jet metho

Description

Direct Method

Features

  • Atmospheric pressure plasma processing system for generating radicals, ions and electrons between a substrate and an electrode and processing it directly.
  • It is an effective tool for organic matter removal, surface modification and surface roughening of film and glass substrates.
  • It is suitable for porcessing finer than corona discharge.
    +It supports R2R system

Maximum processing width: Up to 2,000mm

Corresponding reaction gas: CDA, N2, Ar, He, O2, CF4 etc.

Remote Method

Features

  • Atmospheric pressure plasma processing equipment that generates radicals, electrons and ions at different locations and blows only radicals onto the substrate.
  • There is no damage on the electron, ion base materials compare to the direct method.

Maximum processing width: Up to 500mm

Corresponding reaction gas: CDA, N2, Ar, He, O2, CF4 etc.

Arc Jet Method

Features

  • It is the optimal method for local processing.
  • It is possible to respond to various postings of three-dimensional by using the robot mechanism.
  • Spray only the radical component to the target.

Maximum processing width: 10 to 35mm

Corresponding reaction gas: CDA, N2, Ar, He, O2, CF4 etc.