Effective for organic matter removal, surface modification and surface roughening of film and glass substrates
Suitable for processing finer than corona discharge
Corresponds to R2R system
3 different type of method ~ Direct method / Remote method / Arc Jet metho
Description
Direct Method
Features
Atmospheric pressure plasma processing system for generating radicals, ions and electrons between a substrate and an electrode and processing it directly.
It is an effective tool for organic matter removal, surface modification and surface roughening of film and glass substrates.
It is suitable for porcessing finer than corona discharge. +It supports R2R system
Maximum processing width: Up to 2,000mm
Corresponding reaction gas: CDA, N2, Ar, He, O2, CF4 etc.
Remote Method
Features
Atmospheric pressure plasma processing equipment that generates radicals, electrons and ions at different locations and blows only radicals onto the substrate.
There is no damage on the electron, ion base materials compare to the direct method.
Maximum processing width: Up to 500mm
Corresponding reaction gas: CDA, N2, Ar, He, O2, CF4 etc.
Arc Jet Method
Features
It is the optimal method for local processing.
It is possible to respond to various postings of three-dimensional by using the robot mechanism.
Spray only the radical component to the target.
Maximum processing width: 10 to 35mm
Corresponding reaction gas: CDA, N2, Ar, He, O2, CF4 etc.