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Hitachi

Hitachi High-Tech in Korea

  • High speed scanning with galvano scanner
  • Various patterning, marking for ITO,/metal/organic film, general resin etc.
  • 355nm/532nm/1064nm Wavelength

Description

Features

  • Make it possible to experience High speed scanning with high performance galvano scanner
  • On-the-fly control Linear stage high speed processing processing possible
  • Support the special dust collecting mechanism

Applications

OLED, Solar Cell, Semiconductor, Liquid Crystal Panel etc.

Processing target

ITO film, Metal film, Organic film, General resin etc.

Oscillator

Excimer, 355nm, 532nm, 1064nm, CO2, nanosec, picosec etc.

Processing Example


Patterning


Half Cut / Full Cut


Marking