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Hitachi

Hitachi High-Tech in Korea

R2R Laser Patterning System for Film

  • High Performance R2R Laser patterning
  • Laser LD pumped YV04 laser mounted
  • 355nm/532nm/1064nm Wavelength, CO2
  • Various patterning for Touch Panel, Solar cell,
    Functional film etc.

Description

Features

  • High Performance for devices on resin films and metal wheels

It is a laser patterning system. As a general specification of the device.

  1. Laser: LD pumped YV04 laser mounted
  2. Wavelength: 1064nm 532nm 355nm or CO2
  3. Target: organic resin film, metal wheel etc.
  4. Head: multihead or Galvano scanner head
  5. Stage speed: up to 1000nm/s
  6. Beam type: circular or short system
  7. Processing example: touch panel electrode patterning, film solar cell scribing, various patterning of functional film

Laser oscillator Diode pumped Nd：YVO4 Laser
Laser wavelength 1064nm、532nm or 355nmc
Can support work from 50mm x 50mm ～ 300mm x 300mm
Size of equipment W 1,500mm × L 1,200mm × H 2,300mm
Scanning speed Max、41000mm/s
Beam profile Circle or Square

Laser oscillator Diode pumped Nd：YVO4 Laser
Diode pumped Yb：Fiber Laser
Laser wavelength 1064nm、532nm or 355nm
Can support work up to ～G5
Size of equipment W 4,000mm x L 4,000mm x H 2,400mm
Stage
Positioning accuracy		 <±30um
Scanning speed Max、1000mm/s
Number of beam heads ～ 12 Heads