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Analytical FE-SEM combines the field-proven stability, high current, and brightness with ultra-high resolution required for a multitude of analytical applications. The Duo-objective Lens designed with a semi-in-lens optics provides capabilities for a wide range of applications that require high-resolution image observation and analysis. The SU-70 offers a industry-leading technology, quality, and reliability.
The Hitachi SU-70 Analytical Field Emission SEM combines the field proven stability, high current and brightness of the Schottky electron source with the ultra-high resolution required in a multitude of analytical applications. Designed with a semi-in-lens optical configuration, Hitachi's patented ExB technology provides a unique electron signal filtering and mixing system suited for today's demanding applications for research and development and multidiscipline studies.
The large specimen stage and analytical chamber accommodate a wide variety of analytical instrumentation such as EDS*, WDS*, EBSP*, CL*, STEM*, and e-Beam Lithography* techniques optimized for simultaneous analysis.
The SU-70 Analytical FESEM continues the tradition of providing industry leading technology coupled with the quality and reliability recognized throughout the industry in Hitachi products and services.
Ultra high resolution performance made possible with Hitachi's patented semi-in-lens optical design and electron gun technology.
Enables SE and BSE signal collection and control to eliminate or reduce specimen charging and enhance compositional contrast information.
Provides high resolution, sub nanometer level surface observation at ultra-low accelerating voltages down to 100 V by utilizing the electron beam deceleration function.
High current and high resolution conditions are optimized for analytical techniques such as EDS*, WDS*, EBSP*, CL*, and e-Beam lithography* for increased productivity and throughput.
Hitachi's unique FF mode eliminates the projected magnetic field of the objective lens associated with semi-in-lens technology, and thereby eliminates artifacts during analysis of magnetic samples and with EBSP* applications.
Designed to optimize the simultaneous analysis of a wide variety of analytical techniques such as EDS*, WDS*, EBSP*, CL* and e-Beam Lithography* by optimizing the analytical detector solid angle and maintaining high resolution.
Specimen Courtesy of OLYMPUS Corporation.
Dark contrast shows protein distribution on substrate.
BSE and SE signal mixed image acquired at 1 kV.
Elemental analysis of precipitate.
High probe current application -WDS analysis-
WDS map shows Molybdenum distribution in precipitates.
High probe current of SU-70’s electron optics supports WDS analysis.
Specimen : AlGaN
HV : 2 kV
Pan-chromatic CL image
Specimen : AlGaN / GaN
HV : 2 kV
RGB overlaid image
R : 345 nm
G : 328 nm
B : 310 nm