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New CD-SEM designed for sub-22nm technology node and beyond.
CG5000 delivers High-Resolution, High-Throughput and High-Repeatability by utilizing improved electron optics, advanced image processing and new wafer transfer system.
CG5000 is also capable of enhanced automatic calibration, providing long-term stability.
In addition, CG5000 has new applications and measurement techniques to be able to meet measurement challenges for new process and new materials for 1Xnm process development.
High throughput is achieved by new wafer transfer system, high speed AF, and MAM time reduction by optimizing measurement area using multiple pixels ratio.
CG5000 improves image sharpness by Image Enhancement in order to achieve High-Precision measurements for 1Xnm node patterns.