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Hitachi High-Tech

Hitachi High-Tech Corporation announced the development of an all-new high-performance "Ethos" Focused Ion Beam-Scanning Electron Microscope (FIB*1-SEM*2) that incorporates world-class Hitachi High-Tech core technologies in the form of a high-intensity cold-cathode field emission electron gun combined with a newly developed magnetic/electrostatic compound lens.

The Ethos FIB-SEM system incorporates a FIB column used in sample preparation along with the newest SEM concept for high-magnification observation, and is expected to become an essential tool for a wide range of fields such as semiconductors, nanotechnology, materials science, medicine, and biology for the study of sub-surface structures and the preparation of thin-film samples for Transmission Electron Microscopy (TEM*3) analysis. The Ethos FIB-SEM system enables the analysis of microscopic surface structure and topography at the micron scale, especially in the fields of high-performance devices and nanomaterials, where miniaturization has been advancing recently. The Ethos system is designed to play an important role in the preparation of uniformly thin, high-grade TEM samples for observation and analysis of fine structure at atomic levels, as well as for defect analysis and evaluation.

The Ethos FIB-SEM system enables high-resolution imaging at low acceleration voltages, and by combining with ACE*4 technologies (technologies that suppress curtaining effects or striations*5 during cross-section sample preparation), which enable high-grade TEM sample preparation, the Ethos FIB-SEM system is capable of preparing high-grade and high-quality TEM samples uniformly in its triple-beam configuration.

The Ethos FIB-SEM system is designed with an innovative large-volume sample chamber equipped with ports for Energy Dispersive X-ray Spectrometer (EDS*6) and Electron Backscatter Diffraction (EBSD*7), along with a multitude of additional analytical detection configurations possible with optimum detector positioning. The sample chamber is designed for users who are prepared for customization and upgradeability in the future. Samples can be processed and observed from all angles with a large 155-mm X-Y stage. Design considerations for the modern scientists in every field delivers Ethos for looking at not only the latest semiconductors, but also everything from biological samples to magnetic materials such as steel.

FIB:Focused Ion Beam
SEM:Scanning Electron Microscope
TEM:Transmission Electron Microscope
ACE:Anti Curtaining Effect
Curtaining effects: When processing samples via FIB, variations in the processing rate due to factors such as sample structure and material composition can result in surface roughness. These phenomena are known as curtaining effects.
EDS:Energy Dispersive x-ray Spectrometer
EBSD:Electron Backscatter Diffraction

Main features

  1. High-resolution observation realized by high-intensity cold-cathode field emission electron gun and newly developed magnetic/electrostatic compound lens system.
  2. SEM column fitted with three detectors to enable multiple contrast observation, such as topographic contrast from secondary electrons as well as compositional contrast from electron backscatter.
  3. Rapid processing due to FIB with high current density.
  4. High-volume sample chamber for varied applications also fitted with stage offering high stability and precision.
  5. High-grade TEM sample preparation possible with Micro Sampling* and Triple Beam system*.


"Ethos" High-Performance Composite FIB-SEM

Main Specifications

Main Specifications
SEM optical system
Electron sourceCold-cathode field emission type
Accelerating voltage0.1-30 kV
Resolution1.5 nm (1 kV), 0.7 nm (15 kV)
FIB optical system
Accelerating voltage0.5-30 kV
Maximum beam current100 nA
Resolution4.0 nm (30 kV)
Movable rangeX: 0-155 mm, Y: 0-155 mm, Z: 0-16.5 mm, T: -10-59°, R: 360°
*Stroke may be restricted by the sample holder.
Sample size150 mm diameter max.

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