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We will provide sample processing tailored to the customer's application for free for the first time.
Please make inquires our company regarding wafer size, number of wafer for processing, etc.
Filamentless µ wave Neutralizer
IML-6-1 Sheet Etching Device
|Ion source size||Φ200|
|イIon source voltage||300～1000V|
|Current density||~ 1 mA/cm2|
|Object substrate||1 × 5 "|
|Holder motion||Rotation and inclination|
|Holder cooling||Water cooling / Gas cooling|
Machine with two treatment rooms is also possible.