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-Overlay Measurements of Semi-conductor Device Patterns Using Electron Beam-
Tokyo, Japan, October 13, 2016 – Hitachi High-Technologies Corporation (TSE:8036, Hitachi High-Tech) announced a sales launch of Advanced High Voltage CD-SEM*1 - CV5000 Series, which is capable of measuring High Aspect Ratio (HAR) trenches and contact holes, and to perform overlay measurements of device patterns to help customers increase productivity in semiconductor device manufacturing.
Recent efforts to enhance performance of advanced semiconductor devices include not only miniaturization, but also advances in three-dimensional reconstruction. The mainstream architecture of a semiconductor device now is a stack of multiple elements arranged vertically, especially in 3D-NAND*2 flash-memory chips, Fin-FET*3 logic transistors and VIT*4 interconnects.
During the manufacturing process of these devices, there is a greater need than before for high precision measurement of the bottom dimensions of deep trenches and contact holes. Moreover, the overlay alignment precision of each layer has also become very important.
The newly launched CV5000 series is fitted with a 30 kV electron gun and a detection system that is capable of detecting secondary electrons (SE*5) and backscattered electrons (BSE*6) emitted from a sample based on the electrons’ emission angle and energy. This detection system enables the tool to measure at the bottom of deep trenches and contact holes with aspect ratios of more than 40 on advanced devices, and to perform high precision overlay measurements of the device patterns.
The special mark which is necessary for conventional optical overlay measurement is not used, although Hitachi High-Tech enables the products to measure device patterns directly with a high acceleration electron beam. This measurement method improves the overlay alignment precision of the device patterns, either on the same layers or different layers.
CV5000 series will be introduced at SEMICON JAPAN 2016 at Tokyo Big Sight from December 14 to 16, 2016.
The Hitachi High-Tech Group will continue aiming to lead the world in the high-tech solutions business, and will respond swiftly to the needs of customers and the market from the customer’s perspective as a business creating company working at the cutting edge on the front-line.
Advanced High Voltage CD-SEM CV5000 Series
|Acceleration voltage of electron beam||30 kV (Maximum)|
|Measurement function||Overlay measurement|
|Auto-loader||3 FOUP*7-compatible random access|
|Power supply||Single-phase AC200 V, 208 V, 230 V, 12 kVA (50/60 Hz)|
CD measurement of deep holes
Overlay measurements between upper and lower layers using high acceleration of electron beam