An ion sputter increases the conductivity of non-conductive sample to prevent charging during electron microscope observation. MC1000 employs magnetron sputtering technology to reduce damage to the sample, and the target can be selected from among Pt, Pt-Pd, Au and Au-Pd depending on the purpose.
ArBlade 5000 supports both cross-section milling and flat milling to prepare samples depending on the purpose. Cross section width can be expanded to 8mm for applications requiring wide area milling such as electric components.
The innovative ZONETEM II Desktop Sample Cleaner uses UV-based cleaning technology to minimize or eliminate hydrocarbon contamination for electron microscopy imaging. ZONE offers easy-to-use cleaning for pre-analysis sample preparation, ensuring the best possible data from your TEM samples.
The IM4000Plus Ion Milling System utilizes a broad, low-energy Ar+ ion beam milling method to produce wider, undistorted cross-section milling or flat milling, without applying mechanical stress to the sample.