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Hitachi High-Tech GLOBAL

Spin Processor (MSP-1)

This spin processor is suitable for R&D and small production.
All processes from chemical process to dryer are in one cup.



  • Minimum footprint
  • Accurate wet process by single wafer processing
  • Possible consistent treatment from chemical treatment to dry
  • Your request to the combined full custom rooms available
  • Si wafer, glass substrate, compound wafer and so on is applied.
  • Round wafer and square wafer is applied
  • The processing configuration layout along your request to be constructed
  • Inorganic acid inorganic alkali organic acid organic alkali function water can be use
  • Possible to save costs associated with a chemical solution recycling (by the processing work)
  • Brush scrub,ultrasonic cleaning,FOUP,SMIF and underwater loader is available.
  • You can choose many options for example chemical supply system.