Skip to main content
The AFM5500M is an AFM platform equipped with a fully addressable 4-inch stage, optimized for medium-sized samples. It affords exceptional levels of ease of use, automation, and accuracy, as well as correlation for AFM/SEM investigations.
Easy and quick positioning
Automated cantilever exchange
Easy to remove/attach
Conventional AFM with a piezoelectric tube scanner requires data flattening or leveling because of its intrinsic curved motion. However, this flattening may distort a sample' s micro-surface structure, including its Z value. The newly developed AFM5500M is equipped with a flexure-based scanner that enables well-controlled raster scans along X and Y directions only. As a result, this advanced scanner design can effectively eliminate background curvatures in a wide scan area and improve the accuracy of AFM measurements.
Sample ：Amorphous silicon thin film on a silicon substrate
Using a conventional piezoelectric tube scanner can cause cross-talk when bending the tube scanner.
This cross-talk leads to distortions and asymmetrization. The improved AFM5500M’s scanner reduces cross-talk making both accurate and symmetric measurements possible.
Sample : Textured-structure solar battery(having symmetrical structure due to its crystal orientation.)
The Hitachi-proprietary SEM/AFM shared alignment holder provides quick and easy measurements and analysis of topography, structures, composition, and surface property.
The ovrlay images createed by using AZblend Ver.2.1, ASTRON Inc.
Overlay images of SEM, AFM (topography), and KFM (surface potential)
Hitachi High-Tech Science will continue to develop AFM-correlated systems with other types of microscopes and inspection equipment.
|Stage||Automated, fully addressable 100 mm (4 inch) stage
Travel range: XY ±50 mm (2 inch), Z ≥21 mm
Minimum step size: XY 2 µm, Z 0.04 µm
|Sample Size||Diameter：100 mm (4 inch)
Thickness： 20 mm
Weight： 2 kg
|Scan Range||200 µm x 200 µm x 15 µm (XY: Closed loop control, Z: Displacement sensor)|
|RMS Noise Level*||≤0.04 nm (High-resolution mode)|
|Repeatability*||XY: ≤15 nm(3σ, measuring 10 µm pitch)/Z: ≤1 nm (3σ, measuring 100 nm depth)|
|Bow*||≤2 nm/50 µm|
|Detection||Optical lever (Low-coherence light)|
|Top-viewOptical Microscope||Zoom magnification: x1 ～ x7
Field of vision: 910 µm x 650 µm ～130 µm x 90 µm
Monitor magnification: x465 ～ x3255 (27 inch monitor)
|Anti-vibration||Desktop active anti-vibration 500 mm(W) x 600 mm (D) x 84 mm (H), approximately 28kg|
|Soundproof Cover||750 mm(W) x 877 mm (D) x 1400 mm(H), approximately 237 kg|
|Size||400 mm(W) x 526 mm(D) x 550 mm(H), approximately 90 kg|
|RealTune® II||Automatic tuning of cantilever amplitude (DFM), contact force, scan speed, and feedback gains
(Various tuning modes including Auto, Fast, Soft, Rough, and Point)
|Various Functions||Operating instructions; Tab structure (Measurement/ Analysis); Measurement area indicator/ Measurement area tracking window; Batch processing; and Tip calibration|
|Operating Voltage||0～150 V|
|4 channels (max. 2048 x 2048)
2 channels (max. 4096 x 4096)
|Rectangular Scan||2:1, 4:1, 8:1, 16:1, 32:1, 64:1, 128:1, 256:1, 512:1, 1,024:1|
|Analysis Software||3D display and overlay, Roughness, Cross-section, Average cross-section|
|Automated Functions||Automated cantilever exchange and laser alignment|
|Size||340 mm(W) x 503 mm(D) x 550 mm(H), approximately 34 kg|
|Power Supply||AC 100～240 V ±10%|
|Measurement Modes||AFM(contact mode), DFM (tapping mode), PM, FFM, LM-FFM, VE-AFM, Adhesion, Current, Pico-Current, SSRM, PRM, KFM, EFM（AC), EFM（DC), MFM, SIS-Topography, SIS-Property|
|Compatible Hitachi SEM||SU8240, SU8230 (H36 mm), SU8220 (H29 mm)|
|Sample Holder Size||41 mm(W) x 28 mm(D) x 16 mm(H)|
|Sample Size||Φ20 mm x 7 mm|
|Alignment Accuracy||±10 µm (AFM alignment accuracy)|