Advanced CD Measurement SEM CS5000
A sustainable CD measurement solution to a wide range of 4, 6, and 8 inch wafer Fabs
The Advanced CD Measurement SEM CS5000 provides high-quality SEM imaging, improved measurement precision, and fast, automated operation, designed to improve productivity and operating efficiency of existing manufacturing lines and increase customer's process control capability. In addition, the CD-SEM: CS5000 can be configured to handle three different wafer sizes that can be switched by the customer using to a new wafer-transfer system*. Various wafer materials such as Silicon Carbide (SiC) and Gallium Nitride (GaN) to meet diversified customer's needs for new semiconductor or electronic devices are supported.
* The shared port is an optional function. It requires a holder change to match the wafer size. Please note that compatibility may be restricted depending on the specific wafer and cassette specifications.
Features
- Tool footprint and GUI*1 are designed for easy replacement of existing tools.
- Proven high-precision measurements, latest metrology applications are available.
- Improved throughput during continuous measurement through significant enhancements to the wafer transfer system.
- Supports insulating wafers—previously unmeasurable—by implementing new electron-optical conditions.
- Supports multiple wafer sizes (4, 6, and 8 inches) using dedicated holders.
*1 GUI (Graphic User Interface): A software operating system interfacing a computer's graphic display with the use of a mouse and other pointing devices.
Specifications
| Secondary electron image sharpness(*) | ≦3.8nm (Accelerating voltage: 800 V) (*)Secondary electron resolution reflects the updated evaluation method and is termed "secondary electron image sharpness." |
|---|---|
| Wafer size | 100, 150, and 200 millimeters in diameter |
| Auto-loader | 2 ports |
| Equipment size (main body) in millimeters | 1180(W) × 1632(D) × 1990(H)mm |
