Photomask Repair System MR8000
This FPD photomask defect repair system uses focused ion beam (FIB) technology and supports large scale photomasks.
A rotation mechanism inside the chamber minimizes an installation area.
Supports large flat panel dispray masks
Can take large photomasks up to a maximum size of 1400×1600 mm.
Can deposit high adhesion film Can form film
with adhesion strength comparable to Cr film on the mask using a special gas.
Can repair gray tone masks
FIB carbon deposition function allows repair of clear defects in gray-tone masks that use half-tone films.
|Mask sizes||Max: 1400×1600 mm
Max thickness: 15 mm
Min thickness: 5 mm
|Repair accuracy||50 nm@3σ|
|Clear defect repair method||FIB carbon deposition|
|Opaque defect repair method||Gas-assisted etching|