Focused ion beam (FIB) systems can be used for imaging and processing microstructures. Meanwhile, FIB-SEM systems combine FIB functionality with scanning electron microscopes (SEM), resulting in high-performance analytical systems capable of imaging, processing, and sample preparation with a single unit. These systems are widely utilized in fields requiring nanoscale-level precision work, such as semiconductor industry and material science.
Among such systems, the Ethos NX5000 series allows for high-resolution SEM imaging even at low acceleration voltages and is equipped with the “Cut & See” function, which allows users to simultaneously perform processing and imaging using the FIB-SEM system. It also supports micro-sampling for the accurate extraction of microscopic samples and the Ar/Xe triple beam for minimizing sample damage, making this series ideal for the preparation of TEM samples.
Furthermore, it is equipped with diverse analytical functions such as 3D analysis and EDS/EBSD, as well as an intuitive user interface, delivering high productivity and reliability in research and development settings.