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Field Emission Transmission Electron Microscope HF5000

Field Emission Transmission Electron Microscope HF5000

Hitachi's unique 200 kV aberration-corrected TEM/STEM: the perfect harmony of imaging resolution and analytical performance

0.078 nm spatial resolution in STEM is achieved together with high specimen-tilt capability and large solid angle EDX detector(s), all in a single objective lens configuration.
The HF5000 builds on features from Hitachi HD-2700 dedicated STEM including Hitachi's own fully automated aberration corrector, symmetrical dual SDD EDX and Cs-corrected SE imaging. It also incorporates the advanced TEM/STEM technologies developed in the HF series.
Integrating these accumulated technologies into a new 200 kV TEM/STEM platform results in an instrument with an optimum combination of sub-Å imaging and analysis, as well as the flexibility and unique capabilities to address the most advanced studies.

With monitor screens embedded and 2nd monitor option.

    Features

    1. Hitachi fully automated probe-forming spherical aberration corrector
    2. High-brightness and high-stability cold FE electron gun (Cold FEG)
    3. Ultra-stable column and power supplies for enhanced instrument performance
    4. Simultaneous Cs-corrected SEM & STEM imaging capability with atomic resolution
    5. New high-stability side-entry specimen stage and specimen holders
    6. Symmetrically opposed dual 100 mm2 EDX* detectors : "Symmetrical Dual SDD*"
    7. Newly designed enclosure for optimum performance in real laboratory environments
    8. A wide range of Hitachi advanced specimen holders*
    *
    Option

    High-brightness Cold FEG×High-stability×Hitachi automated aberration corrector

    The new high-stability Cold FEG uses a thoroughly redesigned version of Hitachi's long-established cold field-emission electron source technology.
    Total system stability has also been optimized in order to achieve sub-Å imaging. The column, power supplies and specimen stage have all been newly designed to offer the very best mechanical and electrical stability. Combining these capabilities with Hitachi's unique fully-automated probe-forming Cs-corrector, just requiring a single click of a mouse, ensures all users can reach the very best performance quickly and easily.

    Si(211) single crystal HAADF-STEM image (left), image intensity profile (right lower) and FFT power spectrum (right upper)
    Si(211) single crystal HAADF-STEM image (left), image intensity profile (right lower) and FFT power spectrum (right upper)

    Symmetrically opposed dual 100 mm2 EDX* detectors : "Symmetrical Dual SDD*"

    High-sensitivity, high-throughput EDX is achieved with symmetrically opposed dual 100 mm2 SDDs.
    The symmetrical dual SDD configuration results in an almost constant count rate when tilting. On crystalline samples, EDX acquisition can be performed simply with the zone axis aligned, compared with single detector configuration.
    The large solid angle also means that EDX mapping can be achieved even on beam-sensitive and/or low X-ray yield specimens, including atomic column mapping. High pixel resolution EDX with wide field of view is also achievable, providing large high-resolution datasets.

    GaAs (110) atomic column EDX elemental mapping
    GaAs (110) atomic column EDX elemental mapping

    Simultaneous Cs-corrected SEM & STEM imaging

    Simultaneous SEM & STEM imaging is offered as standard, with ET-type SE detector.
    This enables the correlation of surface and internal information with insights into the 3D structure of the specimen, without the need to perform 3D tomography.
    Additionally, the Cs-corrected SEM image offers higher spatial resolution with more faithful surface information

    Au/CeO2 catalyst SEM/ADF-/BF-STEM images (upper), and respective high resolution Au particle images (lower).
    Au/CeO2 catalyst SEM/ADF-/BF-STEM images (upper), and respective high resolution Au particle images (lower).

    Specifications

    ItemDescription
    Electron source W(310) cold field emission electron source
    Accelerating voltage 200 kV, 60 kV*1
    Imaging
    resolution
    STEM 0.078 nm(ADF-STEM image)
    TEM 0.102 nm(lattice image)
    MagnificationSTEM ×20~×8,000,000
    TEM ×100~×1,500,000
    Specimen stageSpecimen stage Eucentric goniometer 5-axis stage
    Specimen size 3 mm Φ
    Specimen traverse X, Y=±1.0 mm, Z=±0.4 mm
    Specimen tilt α=±25°, β=±35°(Hitachi double-tilt specimen holder*1)
    Aberration corrector Hitachi in-house probe-forming spherical aberration corrector (standard equipment)
    Image displayPC & OS Windows® 7 *2
    Monitor 27-inch wide LCD panel (for standard monitor and 2nd monitor*1)
    Camera Standard retractable camera
    Screen camera*1 (for viewing fluorescent screen)

    Dimensions & Weight

    Item Width×Depth×Height(mm) Weight(kg)
    Column (incl. electron gun) 1,060×1,742×2,970 1,940
    Main unit cover 1,678×1,970×3,157 429
    Console unit 1,400×819×740 132
    Console extension*1 580×819×740 53
    FE tank 1,041×840×1,317 482
    V0 tank 398×630×1,046 164
    Control power supply 1,400×693×816 173
    Corrector power supply 606×529×1,096 81
    Evacuation power supply 913×663×1,790 378
    Deflection power supply 913×663×1,790 394
    Weight 280×130×130 23
    Gatan controller*1*3 576×648×1,173 150
    Cooling water control unit 470×540×350 25
    Cooling water recirculator*1*3 970×970×1,064 95
    Dry pump*1 252×400×336 23
    Air compressor*1 275×560×576 25

    Installation site conditions

    Item Description
    Room temperature 15~23℃ (temp. fluctuation : 0.2℃/ h or less)
    Humidity 40~60% RH
    Power Main unit Single phase AC200~240 V ±10%, 50/60 Hz, 10 kVA
    Circuit breaker rating 50 A
    Water recir-culator*1*3 Three phase AC200 V ±5%, 50/60 Hz, 30 A
    Grounding terminal D-class grounding (ground resistance:100 Ω or less)
    Cooling water Flow rate 5.1~5.3 L/min 1 system、2.0~2.2 L/min 1 system
    (pressure 0.25 MPa)
    Water temperature 16~18℃ (temp. fluctuation : ±0.1℃ or less)
    Gas SF6 99.9% or higher、180 k~200 kPa
    N2 99.99% or higher、0~100 kPa
    Air 600 k~800 kPa

    Before placing an order, please check floor vibration, acoustic noise and magnetic flux in the installation room. Concerning those allowable spec., please consult with our local representatives.

    Notes :
    *1 : Option, *2 : Windows is a registered trademark of Microsoft Corp. *3 : Specifications and dimension depend on manufacturer, model and configuration.

    Typical installation layout

    Typical installation layout
    ※A total weight of the above instruments (including maintenance tools) is approximately 5,000 kg.
    ※Please confirm the floor strength of the room(kg/m2)be 3 times of total weight (kg) / floor area(m2) or more.

    Applications

    Hitachi TEM Application Data

    Technical magazine
    "SI NEWS"

    This journal addresses a wide range variety of research papers and useful application data using Hitachi science instruments.

    nanoart

    Photo collections of beauty of metals, minerals, organisms etc. reproduced by the electron microscope and finished more beautifully by computer graphic technology.

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