We have 3 solutions for variety of substrates.
Spin Processor (MSP-1)
This spin processor is suitable for R&D and small production.
All processes from chemical process to dryer are in one cup.
Multi batch type wet station
Our system has batch type cleaning ,resist stripping and etching potions.
All processes from chemical cleaning to dryer are fully automated.
Multi Spin Processor (MSP-2)
Multi spin processor is suitable for mass production and Multi complex process.
Configuration of our Wet station
|Function||Spin unit||Function unit||Option|
|Light emitting diode||
|SiC wafer cleaning||
Electrical conductivity control system by de-ionized water/CO2 membrane
Antistatics for substrate
Chemical supply system
Concentration management by chemical tank weight
This system gathers LotNo.,recipe,time,temperature,concentration,electric energy and so on.
Chemical solution recycling system
Recycling system by filter