Skip to main content

Hitachi High-Tech in India
  1. Home
  2. Products & Services
  3. Manufacturing-Related Equipment and Solutions
  4. Wet Station
  5. Batch Type Wet Station

Multi batch type wet station

Batch Type Wet Station

Our system has batch type cleaning ,resist stripping and etching potions.
All processes from chemical cleaning to dryer are fully automated.

Configuration

-

Features

  • All processes from chemical cleaning to dryer are fully automated.
  • Carrier transfer and carrier loess transfer is selectable
  • You can configure for your application.
  • Layout is In-line type and through-the –wall type.
  • Si wafer, glass substrate, compound wafer and so on is applied.
  • Round wafer and square wafer is applied
  • Dry method is selectable, spin dryer ,IPA vapor dryer and hot blower.
  • inorganic acid inorganic alkali organic acid organic alkali function water can be use
  • You can choose many option ultrasonic cleaning rocking mechanism reversing mechanism

Example

Carrier loess RCA cleaning system
Resist stripping system
Consecutive transfer cleaning system
Dip&Spin cleaning system
Semi-auto cleaning system (front and back)
Manual cleaning system
Carrer RCA cleaning system
Semi-auto cleaning system (right and left)

Contact Us