Wet Station

We have 3 solutions for variety of substrates.

Spin Processor (MSP-1)
This spin processor is suitable for R&D and small production.
All processes from chemical process to dryer are in one cup.

Multi batch type wet station
Our system has batch type cleaning ,resist stripping and etching potions.
All processes from chemical cleaning to dryer are fully automated.

Multi Spin Processor (MSP-2)
Multi spin processor is suitable for mass production and Multi complex process.
Configuration of our Wet station
Function | Spin unit | Function unit | Option |
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Resist strip | |||
Mask blanks |
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Post-CMP cleaner | |||
Light emitting diode |
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SiC wafer cleaning |
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Spin etcher |
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Spin unit
Ultrasonic cleaning unit

Air mist nozzle unit

Brush scrub unit

Chemical CUP unit

Organic solvent unit

N2ion blow unit

Function unit
Both side scrub unit

Beveled edge scrub unit

Bake unit

UV lamp cleaning unit

Wafer reversing mechanism

Underwater loader

Spin chuck sensor

Option
Electrical conductivity control system by de-ionized water/CO2 membrane
Antistatics for substrate

Chemical supply system
Concentration management by chemical tank weight

Traceability system
This system gathers LotNo.,recipe,time,temperature,concentration,electric energy and so on.

Chemical solution recycling system
Recycling system by filter

Others
IPA vapor dryer

Tool cleaner

Clean oven

Wafer transfer

Tool desiccator

Organic fume hood
