Multi batch type wet station
Our system has batch type cleaning ,resist stripping and etching potions.
All processes from chemical cleaning to dryer are fully automated.
- All processes from chemical cleaning to dryer are fully automated.
- Carrier transfer and carrier loess transfer is selectable
- You can configure for your application.
- Layout is In-line type and through-the –wall type.
- Si wafer, glass substrate, compound wafer and so on is applied.
- Round wafer and square wafer is applied
- Dry method is selectable, spin ｄｒｙer ,IPA vapor dryer and hot blower.
- inorganic acid inorganic alkali organic acid organic alkali function water can be use
- You can choose many option ultrasonic cleaning rocking mechanism reversing mechanism