Surface Analysis for Precision Characterization

Hitachi High-Tech America has a state-of-the art microscopy lab in Hillsboro, Oregon. Using innovative X-ray Photoelectron Spectroscopy (XPS), dedicated equipment and a staff of full-time, industry-experienced engineers work on samples for various applications including but not limited to:

Semiconductor surface and interface analysis
Corrosion and oxidation studies
Catalysis and battery material evaluation
Coatings, thin films, and surface treatments
Polymer surface chemistry and functionalization

Available Instrument

ThermoFisher Escalab Xi+

X-ray Photoelectron Spectroscopy (XPS)

Surface Chemistry Characterization at the Nanoscale: XPS is a powerful, surface-sensitive technique that provides detailed information about the elemental composition, chemical states, and electronic environments of materials. It is ideal for analyzing the outermost atomic layers (typically 1–10 nm), enabling in-depth chemical analysis without damaging the sample.
Quantitative Surface Elemental Analysis: Determine the atomic percentages of elements present on the surface of a material, including light elements like carbon, nitrogen, and oxygen.
Chemical State Identification: Distinguish between different oxidation states or chemical environments of elements—crucial for understanding corrosion, oxidation, and chemical modifications.

Chemical state identification tables of thin films on silicon wafers

Thin Film & Coating Evaluation: Analyze film thickness, interface quality, and surface contamination on coatings, polymers, semiconductors, and more.
Depth Profiling (with Ion Sputtering): Characterize compositional changes below the surface by combining XPS with controlled sputter-etching, ideal for multi-layer materials.
Non-Destructive, Precise, and Reproducible: XPS is a non-destructive technique that ensures reliable, repeatable results with minimal sample preparation.