Focused Ion Beam Systems (FIB/FIB-SEM)
Focused Ion Beam System (FIB/FIB-SEM) Lineup
Focused Ion and Electron Beam System Ethos NX5000
The Hitachi Ethos FIB-SEM incorporates the latest-generation FE-SEM with superb beam brightness and stability. Ethos delivers high-resolution imaging at low voltages combined with ion optics for nanoscale precision processing.
Real-time 3D analytical FIB-SEM NX9000
SEM column and FIB column are orthogonally arranged to optimize column layout for 3D structural analysis. FE electron source and its unique detection geometry enable high resolution SEM imaging at beam coincident point. 3D-EDS and 3D-EBSD can be performed without moving the stage. Employing micro-sampling and triple beam system, high quality samples can be prepared for TEM and atom probe.
Focused Ion and Electron Beam System & Triple Beam System NX2000
NX2000 was developed towards the ultimate TEM sample preparation system. FE electron source and high-sensitivity detection system allow high-contrast, real-time end point detection. Sample orientation control technology and Ar/Xe triple beam system enable significant reduction of artefacts and damage during sample preparation. With auto micro-sampling function, the throughput of TEM sample preparation can be drastically improved.
This device is used for preparing the desired wafer part for analysis with STEM, TEM, etc. by extracting a micro sample with an ion beam in the vacuum chamber of an FIB system.