High-Precision Electron Beam Metrology System GT2000
CD-SEM to meet the needs of semiconductor devices development and mass production in High-NA EUV generation
Features
- 100V ultra-low accceleration voltage and ultra-high-speed multi-point measurement functionality for High-NA EUV processes
- High-sensitivity detection system for 3D device structures
- New platforms and new electronic optical systems to improve tool-to-tool CD matching
Resist shrink evaluation results and each condition SEM images
