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Advanced CD Measurement SEM CG7300

Advanced CD Measurement SEM CG7300

For the EUV era device production – High Reliability CD-SEM

Features

  • Realized a wide variety of enhanced and reliable metrology for semiconductor mass production in the EUV Lithography era.
  • Achieved high reliable process control by minimizing machine differences error down to the atomic size level. (Improved to enhance tool-to-tool matching performance by around 10% compared to the previous model.)
  • Clear and high-resolution images are realized by improving environmental resistance and anti-charging high-speed scanning.
  • Applicable to a wide range of metrology needs from high-precision CD to CD Uniformity by improved scanning performance.
  • Contributes to productivity and CoO (Cost of Owner ship) improvement by increasing throughput and improving Edge Exclusion
Concepts of semiconductor process control and CD-SEM tool matching operation
Concepts of semiconductor process control and CD-SEM tool matching operation

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