Micro-hat

Fantasy in semiconductor device. The micrograph shows a micro-hat made from W(tungsten) with a ribbon made from Titanium nitride.

At 57th photo contest hosted by the Japanese Society of Electron Microscopy in 2001.

Condition

Specimen: 64M DRAM
Instrument: Ultra-thin Film Evaluation System HD-2000
Magnification: × 100,000
Accelerating voltage: 200 kV

*All information related to these photographers is based on the information when the photo was taken.

*This work was presented at the "photo contest" hosted by the Japanese Society of Microscopy.

*Reproduction or republication without permission prohibited.

*"nanoart" is registered trademark of Hitachi High-Tech Corporation in Japan.

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